Predicted protein targets (top 5)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CXCR2 | P25025 | 2/20 | 0.38 |
| ▸ | CXCR1 | P25024 | 1/20 | 0.35 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.31 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.31 |
| ▸ | PTPN1 | P18031 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL9966138 | 0.87 | CXCR2 (0.38) | CXCR2CXCR1 | |
| SCHEMBL2881973 | 0.81 | CXCR2 (0.40) | CXCR2CXCR1 | |
| SCHEMBL17831810 | 0.81 | ELANE (0.40) | CXCR2CXCR1MAPK1SMN1; SMN2PTPN1 | |
| SCHEMBL20444099 | 0.80 | CXCR2 (0.41) | CXCR2CXCR1PTPN1 | |
| SCHEMBL18499620 | 0.78 | SMN1; SMN2 (0.44) | CXCR2MAPK1SMN1; SMN2PTPN1 | |
| SCHEMBL12039869 | 0.78 | EGFR (0.34) | CXCR2CXCR1MAPK1SMN1; SMN2PTPN1 | |
| SCHEMBL12399049 | 0.77 | STS (0.47) | CXCR2MAPK1SMN1; SMN2PTPN1 | |
| SCHEMBL17831811 | 0.77 | ELANE (0.40) | CXCR2CXCR1MAPK1SMN1; SMN2PTPN1 | |
| SCHEMBL10204338 | 0.77 | HDAC3 (0.36) | CXCR2MAPK1SMN1; SMN2PTPN1 | |
| SCHEMBL21191392 | 0.76 | CXCR2 (0.41) | CXCR2CXCR1PTPN1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20120156618-A1 | ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD OF FORMING PATTERN USING THE COMPOSITION | FUJIFILM CORPORATION (JP) | 2012-06-21 | — | — | US | disclosed |
| US-20120082939-A1 | ACTIVE LIGHT RAY SENSITIVE OR RADIOACTIVE RAY SENSITIVE RESIN COMPOSITION, AND ACTIVE LIGHT RAY SENSITIVE OR RADIOACTIVE RAY SENSITIVE FILM AND PATTERN FORMING METHOD USING THE SAME | FUJIFILM CORPORATION (JP) | 2012-04-05 | — | — | US | disclosed |
| US-20110318693-A1 | ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION, AND RESIST FILM AND PATTERN FORMING METHOD USING THE SAME | FUJIFILM CORPORATION (JP) | 2011-12-29 | — | — | US | disclosed |
| US-20110183263-A1 | ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD OF FORMING PATTERN USING THE COMPOSITION | FUJIFILM CORPORATION (JP) | 2011-07-28 | — | — | US | disclosed |