Predicted protein targets (top 6)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CXCR2 | P25025 | 2/20 | 0.38 |
| ▸ | CXCR1 | P25024 | 1/20 | 0.35 |
| ▸ | CA12 | O43570 | 1/20 | 0.30 |
| ▸ | CA1 | P00915 | 1/20 | 0.30 |
| ▸ | CA2 | P00918 | 1/20 | 0.30 |
| ▸ | CA9 | Q16790 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL9966103 | 0.87 | CXCR2 (0.38) | CXCR2CXCR1 | |
| SCHEMBL2880822 | 0.80 | CXCR2 (0.40) | CXCR2CXCR1 | |
| SCHEMBL2742190 | 0.78 | ELANE (0.44) | CXCR2CXCR1CA1CA2CA9 | |
| SCHEMBL2742193 | 0.76 | RXFP1 (0.43) | CA12CA1CA2CA9 | |
| SCHEMBL15082411 | 0.76 | CXCR2 (0.44) | CXCR2CXCR1CA12CA1CA2 | |
| SCHEMBL10204305 | 0.74 | HDAC3 (0.39) | — | |
| SCHEMBL12039866 | 0.74 | EGFR (0.35) | CXCR2CXCR1CA12CA1CA2 | |
| SCHEMBL10204320 | 0.73 | ALDH1A1 (0.46) | — | |
| SCHEMBL9963667 | 0.73 | KMT2A (0.35) | CXCR2CXCR1 | |
| SCHEMBL2742220 | 0.73 | STS (0.46) | CA12CA1CA2CA9 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20120156618-A1 | ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD OF FORMING PATTERN USING THE COMPOSITION | FUJIFILM CORPORATION (JP) | 2012-06-21 | — | — | US | disclosed |
| US-20120082939-A1 | ACTIVE LIGHT RAY SENSITIVE OR RADIOACTIVE RAY SENSITIVE RESIN COMPOSITION, AND ACTIVE LIGHT RAY SENSITIVE OR RADIOACTIVE RAY SENSITIVE FILM AND PATTERN FORMING METHOD USING THE SAME | FUJIFILM CORPORATION (JP) | 2012-04-05 | — | — | US | disclosed |
| US-20110318693-A1 | ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION, AND RESIST FILM AND PATTERN FORMING METHOD USING THE SAME | FUJIFILM CORPORATION (JP) | 2011-12-29 | — | — | US | disclosed |
| US-20110183263-A1 | ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD OF FORMING PATTERN USING THE COMPOSITION | FUJIFILM CORPORATION (JP) | 2011-07-28 | — | — | US | disclosed |