SCHEMBL9967356

SCHEMBL9967356

CC(=O)c1ccc(N2C(=O)C3C4C=CC(C4)C3C2=O)cc1

nearest known ligand 0.85

Predicted protein targets (top 14)

geneUniProtsupporting neighboursconfidence
KMT2A Q03164 2/20 0.85
CA1 P00915 10/20 0.60
CA2 P00918 10/20 0.60
ALDH1A1 P00352 2/20 0.60
USP2 O75604 1/20 0.58
CYP3A4 P08684 1/20 0.57
TSHR P16473 1/20 0.57
CYP2C19 P33261 1/20 0.57
NPSR1 Q6W5P4 1/20 0.57
POLB P06746 1/20 0.56
CTDSP1 Q9GZU7 1/20 0.56
TDP1 Q9NUW8 1/20 0.56
LMNA P02545 1/20 0.54
MAPK10 P53779 1/20 0.54

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL20589125 1.00 KMT2A (0.85) KMT2ACA1CA2ALDH1A1USP2
SCHEMBL3201443 0.86 KMT2A (0.63) KMT2ACA1CA2ALDH1A1USP2
SCHEMBL9851212 0.86 KMT2A (0.63) KMT2ACA1CA2ALDH1A1USP2
SCHEMBL15101846 0.86 KMT2A (0.63) KMT2ACA1CA2ALDH1A1USP2
SCHEMBL10014710 0.85 USP2 (0.76) KMT2AALDH1A1USP2CYP3A4TSHR
SCHEMBL20968094 0.84 KMT2A (0.61) KMT2ACA1CA2ALDH1A1USP2
SCHEMBL13318217 0.84 ALDH1A1 (0.66) KMT2ACA1CA2ALDH1A1USP2
SCHEMBL13133138 0.81 KMT2A (0.76) KMT2ACA1CA2ALDH1A1USP2
SCHEMBL15101847 0.81 HTT (0.62) KMT2AALDH1A1USP2CYP3A4TSHR
SCHEMBL5524587 0.80 ALDH1A1 (0.76) KMT2ACA1CA2ALDH1A1USP2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 17 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9023559-B2 Positive photosensitive resin composition, photosensitive resin film prepared by using the same, and semiconductor device including the photosensitive resin film CHEIL INDUSTRIES INC. (KR) 2015-05-05 US disclosed
US-8841064-B2 Positive photosensitive resin composition, photosensitive resin film prepared by using the same, and semiconductor device including the photosensitive resin film CHEIL INDUSTRIES INC. (KR) 2014-09-23 US disclosed
US-8815489-B2 Positive photosensitive resin composition, photosensitive resin film prepared by using the same, and semiconductor device including the photosensitive resin film CHEIL INDUSTRIES INC. (KR) 2014-08-26 US disclosed
US-8785103-B2 Photosensitive novolac resin, positive photosensitive resin composition including same, photosensitive resin film prepared by using the same, and semiconductor device including the photosensitive resin film CHEIL INDUSTRIES INC. (KR) 2014-07-22 US disclosed
US-8765012-B2 Thermosetting composition and printed circuit board using the same SAMSUNG ELECTRONICS CO., LTD. (KR) 2014-07-01 US disclosed
US-8765012-B2 Thermosetting composition and printed circuit board using the same SAMSUNG ELECTRONICS CO., LTD. (KR) 2014-07-01 US disclosed
US-20130171563-A1 Photosensitive Novolac Resin, Positive Photosensitive Resin Composition Including Same, Photosensitive Resin Film Prepared by Using the Same, and Semiconductor Device Including the Photosensitive Resin Film CHEIL INDUSTRIES INC. (KR) 2013-07-04 US disclosed
US-20130137036-A1 Positive Photosensitive Resin Composition, Photosensitive Resin Film Prepared by Using the Same, and Semiconductor Device Including the Photosensitive Resin Film CHEIL INDUSTRIES INC. (KR) 2013-05-30 US disclosed
US-8420287-B2 Positive photosensitive resin composition CHEIL INDUSTRIES INC. (KR) 2013-04-16 US disclosed
US-20120171610-A1 Positive Photosensitive Resin Composition, Photosensitive Resin Film Prepared by Using the Same, and Semiconductor Device Including the Photosensitive Resin Film CHEIL INDUSTRIES INC. (KR) 2012-07-05 US disclosed
US-20120171614-A1 Positive Photosensitive Resin Composition, Photosensitive Resin Film Prepared by Using the Same, and Semiconductor Device Including the Photosensitive Resin Film CHEIL INDUSTRIES INC. (KR) 2012-07-05 US disclosed
US-20120156614-A1 Novel Phenol Compounds and Positive Photosensitive Resin Composition Including the Same SAMSUNG ELECTRONICS CO., LTD. (KR) 2012-06-21 US disclosed
US-20110235292-A1 THERMOSETTING COMPOSITION AND PRINTED CIRCUIT BOARD USING THE SAME SAMSUNG ELECTRONICS CO., LTD. (KR) 2011-09-29 US disclosed
US-20110235292-A1 THERMOSETTING COMPOSITION AND PRINTED CIRCUIT BOARD USING THE SAME SAMSUNG ELECTRONICS CO., LTD. (KR) 2011-09-29 US disclosed
US-20110111346-A1 Positive Photosensitive Resin Composition CHEIL INDUSTRIES INC. (KR) 2011-05-12 US disclosed
US-20100124037-A1 THERMOSETTING COMPOSITION AND PRINTED CIRCUIT BOARD USING THE SAME SAMSUNG ELECTRONICS CO., LTD. (KR) 2010-05-20 US disclosed
US-20100124037-A1 THERMOSETTING COMPOSITION AND PRINTED CIRCUIT BOARD USING THE SAME SAMSUNG ELECTRONICS CO., LTD. (KR) 2010-05-20 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20120156614-A1 Novel Phenol Compounds and Positive Photosensitive Resin Composition Including the Same SUN2, TYR, PSMD2 KMT2A 595/4885CA1 4119/4885CA2 2469/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.