⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Tetrafluoroethylene SCHEMBL3316061 | 0.70 | CA5A (0.60) | — | |
| SCHEMBL2173230 | 0.70 | — | — | |
| SCHEMBL29818845 | 0.67 | TSHR (1.00) | — | |
| SCHEMBL1938 | 0.67 | — | — | |
| Sulfuric Acid SCHEMBL15462484 | 0.67 | — | — | |
| Sulfuric Acid SCHEMBL3699224 | 0.65 | CA5A (1.00) | — | |
| Sulfuric Acid SCHEMBL418399 | 0.65 | CA5A (1.00) | — | |
| Sulfuric Acid SCHEMBL2555505 | 0.65 | CA5A (1.00) | — | |
| Sulfuric Acid SCHEMBL110268 | 0.65 | CA5A (1.00) | — | |
| Sulfuric Acid SCHEMBL8532128 | 0.65 | CA5A (1.00) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 22 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20160276599-A1 | COMPOUND FOR ORGANIC ELECTRIC ELEMENT, ORGANIC ELECTRIC ELEMENT COMPRISING THE SAME AND ELECTRONIC DEVICE THEREOF | DUK SAN NEOLUX CO., LTD. (KR) | 2016-09-22 | — | — | US | disclosed |
| US-9235117-B2 | Pattern forming method, actinic ray-sensitive or radiation-sensitive resin composition, resist film, manufacturing method of electronic device, and electronic device | FUJIFILM CORPORATION (JP) | 2016-01-12 | — | — | US | disclosed |
| US-20150380168-A1 | THIN-LAYER CAPACITORS WITH LARGE SCALE INTEGRATION | SIEMENS AKTIENGESELLSCHAFT (DE) | 2015-12-31 | — | — | US | disclosed |
| US-9152049-B2 | Actinic-ray- or radiation-sensitive resin composition and method of forming pattern using the composition | FUJIFILM CORPORATION (JP) | 2015-10-06 | — | — | US | disclosed |
| US-9128374-B2 | Resist composition and method of forming resist pattern | TOKYO OHKA KOGYO CO., LTD. (JP) | 2015-09-08 | — | — | US | disclosed |
| US-9097971-B2 | Compound, radical polymerization initiator, method for producing compound, polymer, resist composition, and method for forming resist pattern | TOKYO OHKA KOGYO CO., LTD. (JP) | 2015-08-04 | — | — | US | disclosed |
| US-20150079508-A1 | PATTERN FORMING METHOD, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, MANUFACTURING METHOD OF ELECTRONIC DEVICE, AND ELECTRONIC DEVICE | FUJIFILM CORPORATION (JP) | 2015-03-19 | — | — | US | disclosed |
| US-8937056-B2 | Multikinase inhibitors for use in the treatment of cancer | EISAI R&D MANAGEMENT CO., LTD. (JP) | 2015-01-20 | — | — | US | disclosed |
| US-8921028-B2 | Salt, resist composition and method for producing resist pattern | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2014-12-30 | — | — | US | disclosed |
| US-20140147790-A1 | RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN | TOKYO OHKA KOGYO CO., LTD. (JP) | 2014-05-29 | — | — | US | disclosed |
| US-20130303489-A1 | MULTIKINASE INHIBITORS FOR USE IN THE TREATMENT OF CANCER | EISAI R&D MANAGEMENT CO., LTD. (JP) | 2013-11-14 | — | — | US | disclosed |
| US-20130045443-A1 | POLYMER, RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN | TOKYO OHKA KOGYO CO., LTD. (JP) | 2013-02-21 | — | — | US | disclosed |
| US-20130022911-A1 | POLYMER, RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN | TOKYO OHKA KOGYO CO., LTD. (JP) | 2013-01-24 | — | — | US | disclosed |
| US-20120231392-A1 | SALT, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2012-09-13 | — | — | US | disclosed |
| US-20120156617-A1 | ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD OF FORMING PATTERN USING THE COMPOSITION | FUJIFILM CORPORATION (JP) | 2012-06-21 | — | — | US | disclosed |
| US-8113116-B2 | Lithographic printing plate precursor | FUJIFILM CORPORATION (JP) | 2012-02-14 | — | — | US | disclosed |
| US-8039198-B2 | Sulfonium salt-containing polymer, resist composition, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2011-10-18 | — | — | US | disclosed |
| US-20090233223-A1 | SULFONIUM SALT-CONTAINING POLYMER, RESIST COMPOSITION, AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2009-09-17 | — | — | US | disclosed |
| US-20080311515-A1 | POSITIVE RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN | TOKYO OHKA KOGYO CO., LTD. (JP) | 2008-12-18 | — | — | US | disclosed |
| US-20070214987-A1 | Lithographic printing plate precursor | FUJIFILM CORPORATION | 2007-09-20 | — | — | US | disclosed |