Zinc Ion

Zinc Ion

SCHEMBL999229

[BaH2].[O-2].[Ti].[Zn+2]

nearest known ligand 0.00

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⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Zinc Ion SCHEMBL8639819 0.75
Zinc Ion SCHEMBL6056057 0.75
SCHEMBL472218 0.75
Zinc Ion SCHEMBL2542272 0.75
Zinc Ion SCHEMBL16507444 0.75
Zinc Ion SCHEMBL10408443 0.71 GPR39 (0.33)
Zinc Ion SCHEMBL8057707 0.71 GPR39 (0.33)
Zinc Ion SCHEMBL14809810 0.71 GPR39 (0.33)
Zinc Ion SCHEMBL10889842 0.71 GPR39 (0.33)
Zinc Ion SCHEMBL21753941 0.71

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 21 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7846241-B2 Particulate material detecting apparatus NGK INSULATORS, LTD. (JP) 2010-12-07 US claimed
US-20090308251-A1 PARTICULATE MATERIAL DETECTING APPARATUS NGK INSULATORS, LTD. (JP) 2009-12-17 US claimed
EP-2120043-A1 PARTICULATE MATERIAL DETECTING APPARATUS NGK Insulators, Ltd. (JP) 2009-11-18 EP claimed
EP-2088838-B1 Plasma reactor NGK INSULATORS LTD (JP) 2013-09-18 EP disclosed
EP-1643093-B1 PLASMA GENERATING ELECTRODE AND PLASMA REACTOR NGK INSULATORS LTD (JP) 2013-07-31 EP disclosed
EP-1835789-B1 PLASMA GENERATING ELECTRODE AND PLASMA REACTOR NGK INSULATORS LTD (JP) 2013-05-29 EP disclosed
US-7862649-B2 Particulate matter detection device and particulate matter detection method NGK INSULATORS, LTD. (JP) 2011-01-04 US disclosed
US-7846241-B2 Particulate material detecting apparatus NGK INSULATORS, LTD. (JP) 2010-12-07 US disclosed
US-20100221155-A1 Sterilization/Aseptization Apparatus NGK INSULATORS, LTD. (JP) 2010-09-02 US disclosed
US-7771673-B2 removing harmful components contained in engine exhaust gas or exhaust gas from incinerators; prevent deformation or breakage of the electrode disposed inside a plasma reactor due to thermal stress from treating engine exhaust gas having high temperature NGK INSULATORS, LTD. (JP) 2010-08-10 US disclosed
US-20100000404-A1 Particulate matter detection device and particulate matter detection method NGK INSULATORS, LTD. (JP) 2010-01-07 US disclosed
EP-2120043-A1 PARTICULATE MATERIAL DETECTING APPARATUS NGK Insulators, Ltd. (JP) 2009-11-18 EP disclosed
EP-2120044-A1 GRANULAR SUBSTANCE DETECTOR AND GRANULAR SUBSTANCE DETECTING METHOD NGK Insulators, Ltd. (JP) 2009-11-18 EP disclosed
EP-2088838-A2 Plasma reactor NGK INSULATORS, LTD. (JP) 2009-08-12 EP disclosed
US-20090196804-A1 PLASMA REACTOR NGK INSULATORS, LTD. (JP) 2009-08-06 US disclosed
EP-1941912-A1 STERILIZING DEVICE NGK INSULATORS, LTD. (JP) 2008-07-09 EP disclosed
US-20070247076-A1 Plasma generating electrode and plasma reactor NGK INSULATORS, LTD. (JP) 2007-10-25 US disclosed
EP-1835789-A1 PLASMA GENERATING ELECTRODE AND PLASMA REACTOR NGK INSULATORS, LTD. (JP) 2007-09-19 EP disclosed
US-20060153750-A1 removing harmful components contained in engine exhaust gas or exhaust gas from incinerators; prevent deformation or breakage of the electrode disposed inside a plasma reactor due to thermal stress from treating engine exhaust gas having high temperature NGK INSULATORS, LTD. (JP) 2006-07-13 US disclosed
EP-1643093-A1 PLASMA GENERATING ELECTRODE AND PLASMA REACTOR NGK INSULATORS, LTD. (JP) 2006-04-05 EP disclosed