Sulfuric Acid

Sulfuric Acid

SCHEMBL999423

CCCCCCCCCCCCOc1ccccc1.O=S(=O)([O-])[O-].[Na+].[Na+]

nearest known ligand 0.64

Full drug profile on Sugi Atlas →

Known targets — ChEMBL curated mechanism

dacAdacBdacCftsImrcAmrcBmrdA

The experimentally established mechanism targets of Sulfuric Acid. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
LTA4H P09960 2/20 0.64
MLNR O43193 1/20 0.55
NR1I2 O75469 1/20 0.55
ESR1 P03372 1/20 0.55
NR3C1 P04150 1/20 0.55
PGR P06401 1/20 0.55
ADRB2 P07550 1/20 0.55
CHRM2 P08172 1/20 0.55
ADRB1 P08588 1/20 0.55
HTR1A P08908 1/20 0.55
ADRA2A P08913 1/20 0.55
ADORA3 P0DMS8 1/20 0.55
CHRM1 P11229 1/20 0.55
DRD2 P14416 1/20 0.55
ADRA2B P18089 1/20 0.55
ADRA2C P18825 1/20 0.55
CHRM3 P20309 1/20 0.55
MAOA P21397 1/20 0.55
CNR1 P21554 1/20 0.55
SLC6A2 P23975 1/20 0.55

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Sulfuric Acid SCHEMBL27884236 1.00 LTA4H (0.64) LTA4HMLNRNR1I2ESR1NR3C1
Sulfuric Acid SCHEMBL28310397 1.00 LTA4H (0.64) LTA4HMLNRNR1I2ESR1NR3C1
Sulfuric Acid SCHEMBL27884235 1.00 LTA4H (0.64) LTA4HMLNRNR1I2ESR1NR3C1
Sulfuric Acid SCHEMBL30568760 1.00 LTA4H (0.64) LTA4HMLNRNR1I2ESR1NR3C1
Sulfuric Acid SCHEMBL6663317 1.00 LTA4H (0.64) LTA4HMLNRNR1I2ESR1NR3C1
Sulfuric Acid SCHEMBL27884252 1.00 LTA4H (0.64) LTA4HMLNRNR1I2ESR1NR3C1
Sulfuric Acid SCHEMBL27901381 1.00 LTA4H (0.64) LTA4HMLNRNR1I2ESR1NR3C1
Sulfuric Acid SCHEMBL27901380 1.00 LTA4H (0.64) LTA4HMLNRNR1I2ESR1NR3C1
Sulfuric Acid SCHEMBL1774943 1.00 LTA4H (0.64) LTA4HMLNRNR1I2ESR1NR3C1
Sulfuric Acid SCHEMBL3235388 0.97 LTA4H (0.60) LTA4HMLNRNR1I2ESR1NR3C1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 39 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-100526345-C Method for synthesizing carboxyl butadiene-styrene latex used for cement group water-proofing material CHINA PETROLEUM GROUP COMPANY (CN) 2009-08-12 CN claimed
CN-101139413-A Method for synthesizing carboxyl butadiene-styrene latex used for cement group water-proofing material CHINA PETROLEUM GROUP COMPANY (CN) 2008-03-12 CN claimed
WO-2024257411-A1 POLY(VINYL ALCOHOL)-BASED RESIN FILM, OPTICAL FILM, WATER-SOLUBLE FILM, AND POLY(VINYL ALCOHOL)-BASED RESIN COMPOSITION 三菱ケミカル株式会社 2024-12-19 WO disclosed
WO-2024181406-A1 POLYVINYL ALCOHOL-BASED RESIN FILM, OPTICAL FILM, WATER-SOLUBLE FILM, AND POLYVINYL ALCOHOL-BASED RESIN COMPOSITION 三菱ケミカル株式会社 2024-09-06 WO disclosed
WO-2024181405-A1 POLYVINYL ALCOHOL-BASED RESIN FILM, OPTICAL FILM, WATER-SOLUBLE FILM, AND POLYVINYL ALCOHOL-BASED RESIN COMPOSITION 三菱ケミカル株式会社 2024-09-06 WO disclosed
WO-2024181404-A1 POLYVINYL ALCOHOL-BASED RESIN FILM, OPTICAL FILM, WATER-SOLUBLE FILM, AND POLYVINYL ALCOHOL-BASED RESIN COMPOSITION 三菱ケミカル株式会社 2024-09-06 WO disclosed
CN-112262177-B Polyvinyl alcohol film and polarizing film 三菱化学株式会社 2023-08-22 CN disclosed
CN-115003863-A Tin or tin alloy plating solution, method for forming bump, and method for manufacturing circuit board 三菱综合材料株式会社 2022-09-02 CN disclosed
CN-110462108-B Electroplating solution 三菱综合材料株式会社 2022-02-01 CN disclosed
US-11174565-B2 Plating liquid MITSUBISHI MATERIALS CORPORATION (JP) 2021-11-16 US disclosed
CN-111356789-B Tin or tin alloy electroplating solution 三菱综合材料株式会社 2021-04-16 CN disclosed
CN-102329576-A Double-sided pressure-sensitive adhesive tape for fixing decorative sheet for speaker NITTO DENKO CORP 2012-01-25 CN disclosed
CN-101955744-A Acrylic pressure sensitive adhesive and method of preparing the same LG CHEMICAL LTD 2011-01-26 CN disclosed
US-20110014465-A1 Acrylic Pressure Sensitive Adhesive And Method Of Preparing The Same LG CHEM, LTD. (KR) 2011-01-20 US disclosed
CN-100526345-C Method for synthesizing carboxyl butadiene-styrene latex used for cement group water-proofing material CHINA PETROLEUM GROUP COMPANY (CN) 2009-08-12 CN disclosed
CN-100494260-C Agent for suppressing transfer of odor and taste originating from a diacetal, a diacetal composition comprising the agent for suppressing transfer of odor and taste, a polyolefin nucleating agent comp NEW JAPAN CHEM CO LTD (JP) 2009-06-03 CN disclosed
CN-101139413-A Method for synthesizing carboxyl butadiene-styrene latex used for cement group water-proofing material CHINA PETROLEUM GROUP COMPANY (CN) 2008-03-12 CN disclosed
CN-1262587-C Diacetal composition, polyolefin nucleating agent containing the diacetal composition, polyolefin resin composition containing the diacetal composition, process for producing the resin composition, and molded article NEW JAPAN CHEM CO LTD (JP) 2006-07-05 CN disclosed
CN-1649951-A Agent for suppressing transfer of odor and taste originating from a diacetal, a diacetal composition comprising the agent for suppressing transfer of odor and taste, a polyolefin nucleating agent comp NEW JAPAN CHEM CO LTD (JP) 2005-08-03 CN disclosed
CN-1500120-A Diacetal composition, polyolefin nucleating agent containing the diacetal composition, polyolefin resin composition containing the diacetal composition, process for producing the resin composition, and molded article 新日本理化株式会社 2004-05-26 CN disclosed