SCHEMBL9998799

SCHEMBL9998799

C=C(C)C(=O)Oc1ccc(OCOCC(C)(C)C)cc1

nearest known ligand 0.48

Predicted protein targets (top 13)

geneUniProtsupporting neighboursconfidence
ELANE P08246 5/20 0.48
KMT2A Q03164 2/20 0.44
ATM Q13315 1/20 0.44
POLB P06746 1/20 0.40
APEX1 P27695 1/20 0.40
HTT P42858 1/20 0.40
TDP1 Q9NUW8 1/20 0.40
SMN1; SMN2 Q16637 1/20 0.34
L3MBTL1 Q9Y468 1/20 0.33
GAA P10253 2/20 0.33
MAPT P10636 1/20 0.33
LMNA P02545 2/20 0.33
GPR174 Q9BXC1 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL12021000 0.81 ELANE (0.53) ELANEKMT2AATMPOLBAPEX1
SCHEMBL19679615 0.81 ELANE (0.53) ELANEKMT2AATMPOLBAPEX1
SCHEMBL56436 0.78 ELANE (0.69) ELANEKMT2AATMPOLBAPEX1
SCHEMBL11229036 0.77 POLB (0.56) ELANEKMT2AATMPOLBAPEX1
SCHEMBL452749 0.77 ELANE (0.56) ELANEKMT2AATMPOLBAPEX1
SCHEMBL12021711 0.76 ELANE (0.47) ELANEKMT2APOLBSMN1; SMN2L3MBTL1
SCHEMBL17829483 0.75 ELANE (0.44) ELANEKMT2AATMPOLBAPEX1
SCHEMBL10175752 0.75 ELANE (0.47) ELANEKMT2AATMPOLBAPEX1
Butane SCHEMBL15309676 0.75 ELANE (0.61) ELANEKMT2AATMPOLBAPEX1
Ethylene Glycol SCHEMBL8185687 0.75 ELANE (0.61) ELANEKMT2AATMPOLBAPEX1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9017918-B2 Monomer, polymer, chemically amplified positive resist composition, and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2015-04-28 US disclosed
US-9017918-B2 Monomer, polymer, chemically amplified positive resist composition, and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2015-04-28 US disclosed
US-9017918-B2 Monomer, polymer, chemically amplified positive resist composition, and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2015-04-28 US disclosed
US-20110294070-A1 MONOMER, POLYMER, CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION, AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2011-12-01 US disclosed
US-20110294070-A1 MONOMER, POLYMER, CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION, AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2011-12-01 US disclosed
US-20110294070-A1 MONOMER, POLYMER, CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION, AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2011-12-01 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20110294070-A1 MONOMER, POLYMER, CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION, AND PATTERNING PROCESS PARG, PCNA, POLH ELANE 1171/4885KMT2A 873/4885ATM 4312/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.