⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL13296137 | 0.78 | F13A1 (0.54) | — | |
| SCHEMBL9487271 | 0.76 | HMGCR (0.42) | — | |
| SCHEMBL9999107 | 0.76 | — | — | |
| SCHEMBL11792898 | 0.75 | GRIN2D (0.40) | — | |
| SCHEMBL11848883 | 0.69 | ALOX15 (0.39) | — | |
| SCHEMBL542989 | 0.69 | ELANE (0.37) | — | |
| SCHEMBL6904352 | 0.69 | GRIN2D (0.52) | — | |
| SCHEMBL3466279 | 0.69 | HMGCR (0.38) | — | |
| SCHEMBL7299326 | 0.67 | PTPN1 (0.36) | — | |
| SCHEMBL5676840 | 0.67 | ALOX15 (0.56) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 14 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-0068879-B1 | A METHOD OF MAKING INDOLIZINONE-DYES, NOVEL INDOLIZINONE-DYES OBTAINED ACCORDING TO THE PROCESS, METHOD OF PRODUCING IMAGES WITH OXOINDOLIZINONE-DYES AND RADIATION SENSITIVE ELEMENT TO PRODUCE THE IMAGES | EASTMAN KODAK COMPANY (a New Jersey corporation) (US) | 1985-05-15 | — | — | EP | claimed |
| US-4450093-A | LIGHT SENSITIVE ELEMENTS USING AN OXYGEN-FREE REACTION TO FORM AN AZINE DYE | EASTMAN KODAK COMPANY (US) | 1984-05-22 | — | — | US | claimed |
| US-4373021-A | A CYCLOPROPENONE AND A DI OR TRI-HALOGEN COMPOUND WILL REACT WITH PYRIDINE | EASTMAN KODAK COMPANY (US) | 1983-02-08 | — | — | US | claimed |
| EP-0068879-A1 | A method of making indolizinone-dyes, novel indolizinone-dyes obtained according to the process, method of producing images with oxoindolizinone-dyes and radiation sensitive element to produce the images | EASTMAN KODAK COMPANY (a New Jersey corporation) (US) | 1983-01-05 | — | — | EP | claimed |
| EP-2530524-B1 | POSITIVE-TYPE RESIST COMPOSITION AND METHOD FOR PRODUCING MICROLENS | NISSAN CHEMICAL CORP (JP) | 2019-05-29 | — | — | EP | disclosed |
| EP-2397507-B1 | LONG CHAIN ALKYLENE GROUP-CONTAINING EPOXY COMPOUND | NISSAN CHEMICAL IND LTD (JP) | 2017-09-20 | — | — | EP | disclosed |
| US-8912295-B2 | Long chain alkylene group-containing epoxy compound | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2014-12-16 | — | — | US | disclosed |
| US-8778597-B2 | Long-chain alkylene-containing curable epoxy resin composition | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2014-07-15 | — | — | US | disclosed |
| US-8722311-B2 | Positive resist composition and method for producing microlens | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2014-05-13 | — | — | US | disclosed |
| EP-2530098-A1 | LONG-CHAIN ALKYLENE-CONTAINING CURABLE EPOXY RESIN COMPOSITION | Nissan Chemical Industries, Ltd. (JP) | 2012-12-05 | — | — | EP | disclosed |
| EP-2530524-A1 | POSITIVE-TYPE RESIST COMPOSITION AND METHOD FOR PRODUCING MICROLENS | Nissan Chemical Industries, Ltd. (JP) | 2012-12-05 | — | — | EP | disclosed |
| US-20120292487-A1 | POSITIVE RESIST COMPOSITION AND METHOD FOR PRODUCING MICROLENS | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2012-11-22 | — | — | US | disclosed |
| US-20120295199-A1 | LONG-CHAIN ALKYLENE-CONTAINING CURABLE EPOXY RESIN COMPOSITION | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2012-11-22 | — | — | US | disclosed |
| US-20110319589-A1 | LONG CHAIN ALKYLENE GROUP-CONTAINING EPOXY COMPOUND | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2011-12-29 | — | — | US | disclosed |