SCHEMBL10000291

SCHEMBL10000291

CCOC(=O)C(C)(C)CC(C)(C)C(=O)OCCOC

nearest known ligand 0.44

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CYP4F2 P78329 3/20 0.44
CYP4A11 Q02928 3/20 0.44
ALDH1A1 P00352 5/20 0.36
GAA P10253 2/20 0.36
RAB9A P51151 1/20 0.36
TSHR P16473 3/20 0.35
PKM P14618 3/20 0.35
MMP8 P22894 1/20 0.35
KDM4E B2RXH2 1/20 0.34
MEN1 O00255 1/20 0.34
KMT2A Q03164 1/20 0.34
THRB P10828 1/20 0.33
LMNA P02545 1/20 0.33
HSD17B10 Q99714 1/20 0.33
ABCB11 O95342 1/20 0.33
CYP1A2 P05177 1/20 0.33
CYP3A4 P08684 1/20 0.33
HTR2A P28223 1/20 0.33
PMP22 Q01453 1/20 0.33
PPARA Q07869 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1699796 0.88 CYP4F2 (0.36) CYP4F2CYP4A11ALDH1A1GAARAB9A
SCHEMBL18363110 0.85 CYP4F2 (0.55) CYP4F2CYP4A11ALDH1A1GAATSHR
SCHEMBL14770357 0.85 CYP4F2 (0.37) CYP4F2CYP4A11TSHR
SCHEMBL13779183 0.85 TSHR (0.35) CYP4F2CYP4A11ALDH1A1TSHR
SCHEMBL16866690 0.82 CYP4F2 (0.55) CYP4F2CYP4A11ALDH1A1GAATSHR
SCHEMBL837877 0.82 TSHR (0.38) CYP4F2CYP4A11ALDH1A1GAARAB9A
SCHEMBL12788167 0.82 CYP4F2 (0.48) CYP4F2CYP4A11ALDH1A1GAATSHR
SCHEMBL17678856 0.80 TSHR (0.33) TSHR
SCHEMBL16078099 0.79 TSHR (0.38) TSHR
SCHEMBL18068804 0.79 TSHR (0.32) CYP4F2CYP4A11TSHRPPARACYP2D6

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8585917-B2 Etching, cleaning and drying methods using supercritical fluid and chamber systems using these methods SAMSUNG ELECTRONICS CO., LTD. (KR) 2013-11-19 US disclosed
US-20120080059-A1 ETCHING, CLEANING AND DRYING METHODS USING SUPERCRITICAL FLUID AND CHAMBER SYSTEMS USING THESE METHODS LEE HYO-SAN (US) 2012-04-05 US disclosed