Predicted protein targets (top 8)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CYP4F2 | P78329 | 1/20 | 0.36 |
| ▸ | CYP4A11 | Q02928 | 1/20 | 0.36 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.32 |
| ▸ | GAA | P10253 | 1/20 | 0.32 |
| ▸ | RAB9A | P51151 | 1/20 | 0.32 |
| ▸ | THRB | P10828 | 1/20 | 0.32 |
| ▸ | CNR2 | P34972 | 3/20 | 0.31 |
| ▸ | TSHR | P16473 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL10000291 | 0.88 | CYP4F2 (0.44) | CYP4F2CYP4A11ALDH1A1GAARAB9A | |
| SCHEMBL13779183 | 0.78 | TSHR (0.35) | CYP4F2CYP4A11ALDH1A1TSHR | |
| SCHEMBL14770357 | 0.78 | CYP4F2 (0.37) | CYP4F2CYP4A11TSHR | |
| SCHEMBL837877 | 0.75 | TSHR (0.38) | CYP4F2CYP4A11ALDH1A1GAARAB9A | |
| SCHEMBL18363110 | 0.74 | CYP4F2 (0.55) | CYP4F2CYP4A11ALDH1A1GAATHRB | |
| SCHEMBL17678856 | 0.73 | TSHR (0.33) | TSHR | |
| SCHEMBL16078099 | 0.73 | TSHR (0.38) | TSHR | |
| SCHEMBL18068804 | 0.72 | TSHR (0.32) | CYP4F2CYP4A11TSHR | |
| SCHEMBL15198883 | 0.72 | CYP4F2 (0.42) | CYP4F2CYP4A11ALDH1A1GAARAB9A | |
| SCHEMBL16866690 | 0.72 | CYP4F2 (0.55) | CYP4F2CYP4A11ALDH1A1GAATHRB |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8790470-B2 | Etching, cleaning and drying methods using supercritical fluid and chamber systems using these methods | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2014-07-29 | — | — | US | disclosed |
| US-20120085495-A1 | ETCHING, CLEANING AND DRYING METHODS USING SUPERCRITICAL FLUID AND CHAMBER SYSTEMS USING THESE METHODS | LEE HYO-SAN (US) | 2012-04-12 | — | — | US | disclosed |