SCHEMBL10001319

SCHEMBL10001319

CCCCCCCCCCCCc1cc(C)sc1-c1sc(-c2sc(-c3ccc4c(c3)C(CCCCCCCCCCCC)(CCCCCCCCCCCC)c3cc(C)ccc3-4)cc2CCCCCCCCCCCC)c2nc3c(nc12)-c1cccc2cccc-3c12

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL15043363 0.86 — —
SCHEMBL13114505 0.81 — —
SCHEMBL12887135 0.81 — —
SCHEMBL15502144 0.80 — —
SCHEMBL15705876 0.79 PGR (0.33) —
SCHEMBL12131192 0.78 — —
SCHEMBL12131176 0.78 — —
SCHEMBL12610363 0.78 — —
SCHEMBL13930218 0.75 CNR1 (0.34) —
SCHEMBL12131167 0.75 GPR84 (0.31) —

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8759421-B2 Continuous process for preparing nanodispersions using an ultrasonic flow-through heat exchanger SAMSUNG ELECTRONICS CO., LTD. (KR) 2014-06-24 — — US disclosed
US-8759421-B2 Continuous process for preparing nanodispersions using an ultrasonic flow-through heat exchanger SAMSUNG ELECTRONICS CO., LTD. (KR) 2014-06-24 — — US disclosed
US-20120049163-A1 Continuous Process For Preparing Nanodispersions Using An Ultrasonic Flow-Through Heat Exchanger XEROX CORPORATION (US) 2012-03-01 — — US disclosed
US-8030126-B2 Printing process for enhanced jetted performance of semiconductor layer XEROX CORPORATION (US) 2011-10-04 — — US disclosed
US-20110065232-A1 PRINTING PROCESS FOR ENHANCED JETTED PERFORMANCE OF SEMICONDUCTOR LAYER XEROX CORPORATION (US) 2011-03-17 — — US disclosed
US-20110031475-A1 Semiconductor Composition XEROX CORPORATION (US) 2011-02-10 — — US disclosed
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