⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL13642050 | 0.78 | F2R (0.31) | — | |
| SCHEMBL2754963 | 0.74 | — | — | |
| SCHEMBL14399584 | 0.73 | — | — | |
| SCHEMBL10261059 | 0.72 | EPHX1 (0.33) | — | |
| SCHEMBL14299636 | 0.71 | EPHX1 (0.43) | — | |
| SCHEMBL14299638 | 0.70 | EPHX1 (0.38) | — | |
| SCHEMBL13910113 | 0.69 | ALDH1A1 (0.41) | — | |
| SCHEMBL3381296 | 0.69 | CA1 (0.39) | — | |
| SCHEMBL4839197 | 0.69 | CA1 (0.39) | — | |
| SCHEMBL4033152 | 0.69 | CA1 (0.39) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20120282548-A1 | PATTERN FORMING METHOD, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION AND RESIST FILM | FUJIFILM CORPORATION (JP) | 2012-11-08 | — | — | US | disclosed |
| US-8097397-B2 | Material for formation of protective film, method for formation of photoresist pattern, and solution for washing/removal of protective film | TOKYO OHKA KOGYO CO., LTD. (JP) | 2012-01-17 | — | — | US | disclosed |
| US-20100086879-A1 | MATERIAL FOR FORMATION OF PROTECTIVE FILM, METHOD FOR FORMATION OF PHOTORESIST PATTERN, AND SOLUTION FOR WASHING/REMOVAL OF PROTECTIVE FILM | TOKYO OHKA KOGYO CO., LTD. (JP) | 2010-04-08 | — | — | US | disclosed |