Predicted protein targets (top 11)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | AR | P10275 | 9/20 | 0.51 |
| ▸ | SYK | P43405 | 1/20 | 0.50 |
| ▸ | SLC6A4 | P31645 | 2/20 | 0.48 |
| ▸ | HTR2A | P28223 | 1/20 | 0.48 |
| ▸ | KCNH2 | Q12809 | 1/20 | 0.48 |
| ▸ | L3MBTL1 | Q9Y468 | 2/20 | 0.42 |
| ▸ | RAB9A | P51151 | 1/20 | 0.42 |
| ▸ | MAPT | P10636 | 2/20 | 0.41 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.41 |
| ▸ | LMNA | P02545 | 1/20 | 0.40 |
| ▸ | ATM | Q13315 | 1/20 | 0.40 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL10001987 | 0.98 | AR (0.51) | ARSYKSLC6A4HTR2AKCNH2 | |
| SCHEMBL13308509 | 0.95 | AR (0.48) | ARSYKSLC6A4HTR2AKCNH2 | |
| SCHEMBL14586632 | 0.93 | SLC6A4 (0.54) | ARSYKSLC6A4HTR2AKCNH2 | |
| SCHEMBL14549515 | 0.93 | AR (0.47) | ARSYKSLC6A4HTR2AKCNH2 | |
| SCHEMBL12259242 | 0.93 | AR (0.47) | ARSYKSLC6A4HTR2AKCNH2 | |
| SCHEMBL23894307 | 0.92 | LTA4H (0.47) | ARSYKSLC6A4HTR2AKCNH2 | |
| SCHEMBL8737035 | 0.91 | SYK (0.47) | ARSYKSLC6A4HTR2AKCNH2 | |
| SCHEMBL26037439 | 0.90 | TEAD4 (0.46) | ARSYKSLC6A4HTR2AKCNH2 | |
| SCHEMBL10001984 | 0.90 | SYK (0.54) | ARSYKSLC6A4HTR2AKCNH2 | |
| SCHEMBL10001970 | 0.89 | SLC6A4 (0.47) | ARSYKSLC6A4HTR2AKCNH2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 37 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20230260787-A1 | COMPOSITION FOR FORMING PROTECTIVE FILM AGAINST ALKALINE AQUEOUS HYDROGEN PEROXIDE, SUBSTRATE FOR PRODUCING SEMICONDUCTOR APPARATUS, METHOD FOR FORMING PROTECTIVE FILM, AND METHOD FOR FORMING PATTERN | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-08-17 | — | — | US | disclosed |
| US-11676814-B2 | Material for forming organic film, substrate for manufacturing semiconductor apparatus, method for forming organic film, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-06-13 | — | — | US | disclosed |
| US-11319410-B2 | Precursor for polyimide and use thereof | ETERNAL MATERIALS CO., LTD. (TW) | 2022-05-03 | — | — | US | disclosed |
| EP-3889233-A1 | CIRCUIT MATERIAL AND CIRCUIT BOARD CONTAINING THE SAME | Shengyi Technology Co., Ltd. (CN) | 2021-10-06 | — | — | EP | disclosed |
| US-11034797-B2 | Polyimide precursor composition, use thereof and polyimide made therefrom | ETERNAL MATERIALS CO., LTD. (TW) | 2021-06-15 | — | — | US | disclosed |
| US-20210079161-A1 | POLYIMIDE PRECURSOR COMPOSITION, USE THEREOF AND POLYIMIDE MADE THEREFROM | ETERNAL MATERIALS CO., LTD. (TW) | 2021-03-18 | — | — | US | disclosed |
| US-20200381247-A1 | MATERIAL FOR FORMING ORGANIC FILM, SUBSTRATE FOR MANUFACTURING SEMICONDUCTOR APPARATUS, METHOD FOR FORMING ORGANIC FILM, AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2020-12-03 | — | — | US | disclosed |
| US-20200333709-A1 | MATERIAL FOR FORMING ORGANIC FILM, SUBSTRATE FOR MANUFACTURING SEMICONDUCTOR DEVICE, METHOD FOR FORMING ORGANIC FILM, PATTERNING PROCESS, AND COMPOUND FOR FORMING ORGANIC FILM | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2020-10-22 | — | — | US | disclosed |
| US-10696793-B2 | Process for preparing polyimides | ETERNAL MATERIALS CO., LTD. (TW) | 2020-06-30 | — | — | US | disclosed |
| US-10626220-B2 | Precursor for polyimide and use thereof | ETERNAL MATERIALS CO., LTD. (TW) | 2020-04-21 | — | — | US | disclosed |
| US-8349539-B2 | Photosensitive polymides | ETERNAL CHEMICAL CO., LTD. (TW) | 2013-01-08 | — | — | US | disclosed |
| US-8105752-B2 | Photosensitive polyimides | ETERNAL CHEMICAL CO., LTD. (TW) | 2012-01-31 | — | — | US | disclosed |
| US-8105752-B2 | Photosensitive polyimides | ETERNAL CHEMICAL CO., LTD. (TW) | 2012-01-31 | — | — | US | disclosed |
| US-20110212402-A1 | PHOTOSENSITIVE RESIN COMPOSITION AND ITS APPLICATION | ETERNAL CHEMICAL CO., LTD. (TW) | 2011-09-01 | — | — | US | disclosed |
| US-20100086874-A1 | Photosensitive polymides | ETERNAL CHEMICAL CO., LTD. (TW) | 2010-04-08 | — | — | US | disclosed |
| US-20100086874-A1 | Photosensitive polymides | ETERNAL CHEMICAL CO., LTD. (TW) | 2010-04-08 | — | — | US | disclosed |
| US-20100086871-A1 | PHOTOSENSITIVE POLYIMIDES | ETERNAL CHEMICAL CO., LTD. | 2010-04-08 | — | — | US | disclosed |
| US-20100086871-A1 | PHOTOSENSITIVE POLYIMIDES | ETERNAL CHEMICAL CO., LTD. | 2010-04-08 | — | — | US | disclosed |
| US-20090181324-A1 | PHOTOSENSITIVE POLYIMIDES | ETERNAL CHEMICAL CO., LTD. | 2009-07-16 | — | — | US | disclosed |
| US-20090181324-A1 | PHOTOSENSITIVE POLYIMIDES | ETERNAL CHEMICAL CO., LTD. | 2009-07-16 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20200333709-A1 | MATERIAL FOR FORMING ORGANIC FILM, SUBSTRATE FOR MANUFACTURING SEMICONDUCTOR DEVICE, METHOD FOR FORMING ORGANIC FILM, PATTERNING PROCESS, AND COMPOUND FOR FORMING ORGANIC FILM | ICAM1, OR10J3, RIF1 | AR 3441/4885SYK 2367/4885SLC6A4 2701/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.