SCHEMBL10001975

SCHEMBL10001975

Cc1ccc(C(C)(O)c2ccc(C)c(C)c2)cc1C

nearest known ligand 0.48

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
MEN1 O00255 2/20 0.48
KMT2A Q03164 2/20 0.48
ESR1 P03372 4/20 0.44
CYP19A1 P11511 3/20 0.44
MITF O75030 1/20 0.41
ALDH1A1 P00352 2/20 0.40
PRSS1 P07477 1/20 0.38
PRSS2 P07478 1/20 0.38
PRSS3 P35030 1/20 0.38
ESR2 Q92731 3/20 0.38
AR P10275 2/20 0.37
TSHR P16473 2/20 0.36
HPGD P15428 2/20 0.36
HSD17B10 Q99714 2/20 0.36
ALOX15 P16050 1/20 0.36
TDP1 Q9NUW8 1/20 0.36
CASR P41180 1/20 0.36
SLC2A1 P11166 1/20 0.36
CNR1 P21554 1/20 0.36
CNR2 P34972 1/20 0.36

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL12051657 0.84 ESR1 (0.44) MEN1KMT2AESR1CYP19A1MITF
SCHEMBL9064553 0.78 ESR1 (0.61) MEN1KMT2AESR1CYP19A1MITF
SCHEMBL29498849 0.78 TSHR (0.52) MEN1KMT2AESR1CYP19A1ALDH1A1
SCHEMBL2009857 0.78 TSHR (0.52) MEN1KMT2AESR1CYP19A1ALDH1A1
SCHEMBL15957656 0.77 CYP19A1 (0.43) MEN1KMT2AESR1CYP19A1MITF
SCHEMBL12126487 0.77 HSD11B1 (0.47) ESR1CYP19A1
SCHEMBL18155538 0.75 CYP19A1 (0.42) MEN1KMT2AESR1CYP19A1MITF
SCHEMBL23592890 0.74 ALDH1A1 (0.40) MEN1KMT2AESR1CYP19A1MITF
SCHEMBL14189083 0.74 ALDH1A1 (0.40) MEN1KMT2AESR1CYP19A1MITF
SCHEMBL5299447 0.74 ALDH1A1 (0.46) MEN1KMT2AESR1CYP19A1MITF

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 39 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11319410-B2 Precursor for polyimide and use thereof ETERNAL MATERIALS CO., LTD. (TW) 2022-05-03 US disclosed
US-10731004-B2 Polyimide precursor composition and use thereof ETERNAL MATERIALS CO., LTD. (TW) 2020-08-04 US disclosed
US-10696793-B2 Process for preparing polyimides ETERNAL MATERIALS CO., LTD. (TW) 2020-06-30 US disclosed
US-10626220-B2 Precursor for polyimide and use thereof ETERNAL MATERIALS CO., LTD. (TW) 2020-04-21 US disclosed
US-20200055986-A1 PROCESS FOR PREPARING POLYIMIDES ETERNAL MATERIALS CO., LTD. (TW) 2020-02-20 US disclosed
US-10280334-B2 Polyimides, coating composition formed therefrom and use thereof ETERNAL MATERIALS CO., LTD. (TW) 2019-05-07 US disclosed
US-20180194899-A1 PRECURSOR FOR POLYIMIDE AND USE THEREOF ETERNAL MATERIALS CO., LTD. (TW) 2018-07-12 US disclosed
US-20180194899-A1 PRECURSOR FOR POLYIMIDE AND USE THEREOF ETERNAL MATERIALS CO., LTD. (TW) 2018-07-12 US disclosed
US-10018911-B2 Chemically amplified resist material and resist pattern-forming method JSR CORPORATION (JP) 2018-07-10 US disclosed
US-20180148544-A1 PRECURSOR FOR POLYIMIDE AND USE THEREOF ETERNAL MATERIAL CO., LTD. (TW) 2018-05-31 US disclosed
US-20130095426-A1 PHOTOSENSITIVE POLYMIDES ETERNAL CHEMICAL CO., LTD. (TW) 2013-04-18 US disclosed
US-20130095426-A1 PHOTOSENSITIVE POLYMIDES ETERNAL CHEMICAL CO., LTD. (TW) 2013-04-18 US disclosed
US-8349539-B2 Photosensitive polymides ETERNAL CHEMICAL CO., LTD. (TW) 2013-01-08 US disclosed
US-8105752-B2 Photosensitive polyimides ETERNAL CHEMICAL CO., LTD. (TW) 2012-01-31 US disclosed
US-8105752-B2 Photosensitive polyimides ETERNAL CHEMICAL CO., LTD. (TW) 2012-01-31 US disclosed
US-20110212402-A1 PHOTOSENSITIVE RESIN COMPOSITION AND ITS APPLICATION ETERNAL CHEMICAL CO., LTD. (TW) 2011-09-01 US disclosed
US-20110212402-A1 PHOTOSENSITIVE RESIN COMPOSITION AND ITS APPLICATION ETERNAL CHEMICAL CO., LTD. (TW) 2011-09-01 US disclosed
US-20100086871-A1 PHOTOSENSITIVE POLYIMIDES ETERNAL CHEMICAL CO., LTD. 2010-04-08 US disclosed
US-20100086874-A1 Photosensitive polymides ETERNAL CHEMICAL CO., LTD. (TW) 2010-04-08 US disclosed
US-20100086871-A1 PHOTOSENSITIVE POLYIMIDES ETERNAL CHEMICAL CO., LTD. 2010-04-08 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-10018911-B2 Chemically amplified resist material and resist pattern-forming method SLC11A2, XRCC5, RAD54L MEN1 455/4885KMT2A 1432/4885ESR1 593/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.