Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | LMNA | P02545 | 1/20 | 0.72 |
| ▸ | CYP2D6 | P10635 | 3/20 | 0.50 |
| ▸ | ADRB2 | P07550 | 1/20 | 0.50 |
| ▸ | ADRB1 | P08588 | 1/20 | 0.50 |
| ▸ | ADRB3 | P13945 | 1/20 | 0.50 |
| ▸ | MAOA | P21397 | 1/20 | 0.47 |
| ▸ | PTGS1 | P23219 | 1/20 | 0.47 |
| ▸ | MTNR1A | P48039 | 3/20 | 0.46 |
| ▸ | MTNR1B | P49286 | 3/20 | 0.46 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.42 |
| ▸ | MEN1 | O00255 | 2/20 | 0.42 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.42 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.42 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.42 |
| ▸ | HTR1A | P08908 | 1/20 | 0.42 |
| ▸ | ADRA2A | P08913 | 1/20 | 0.42 |
| ▸ | DRD1 | P21728 | 1/20 | 0.42 |
| ▸ | SLC6A2 | P23975 | 1/20 | 0.42 |
| ▸ | SLC6A4 | P31645 | 1/20 | 0.42 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.42 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL970564 | 1.00 | LMNA (0.72) | LMNACYP2D6ADRB2ADRB1ADRB3 | |
| SCHEMBL872625 | 0.98 | LMNA (0.75) | LMNACYP2D6ADRB2ADRB1ADRB3 | |
| Tetraethylene Glycol SCHEMBL15435882 | 0.88 | LMNA (0.57) | LMNACYP2D6ADRB2ADRB1ADRB3 | |
| SCHEMBL3254859 | 0.85 | LMNA (1.00) | LMNACYP2D6ADRB2ADRB1ADRB3 | |
| SCHEMBL1618880 | 0.85 | LMNA (1.00) | LMNACYP2D6ADRB2ADRB1ADRB3 | |
| SCHEMBL50453 | 0.85 | LMNA (1.00) | LMNACYP2D6ADRB2ADRB1ADRB3 | |
| SCHEMBL2943775 | 0.85 | LMNA (1.00) | LMNACYP2D6ADRB2ADRB1ADRB3 | |
| SCHEMBL308324 | 0.84 | LMNA (0.65) | LMNACYP2D6ADRB2ADRB1ADRB3 | |
| SCHEMBL2045144 | 0.84 | LMNA (0.50) | LMNAADRB2ADRB3MEN1KMT2A | |
| SCHEMBL22367716 | 0.84 | LMNA (0.53) | LMNACYP2D6ADRB2ADRB1ADRB3 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 37 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-117784520-A | Photosensitive resin composition, method for producing resist pattern film, and method for producing plating molded article | JSR株式会社 | 2024-03-29 | — | — | CN | disclosed |
| US-20240012326-A1 | PHOTOSENSITIVE ELEMENT, AND METHOD FOR FORMING RESIST PATTERN | ASAHI KASEI KABUSHIKI KAISHA (JP) | 2024-01-11 | — | — | US | disclosed |
| CN-113039070-B | Laminate and method for producing laminate | 东洋油墨SC控股株式会社 | 2023-07-07 | — | — | CN | disclosed |
| CN-116018364-A | Antimicrobial active energy ray-curable coating composition, coating, antimicrobial member, and article | 东洋油墨SC控股株式会社 | 2023-04-25 | — | — | CN | disclosed |
| WO-2022163652-A1 | PHOTOSENSITIVE ELEMENT, AND METHOD FOR FORMING RESIST PATTERN | 旭化成株式会社 | 2022-08-04 | — | — | WO | disclosed |
| US-10415011-B2 | Adherend recovery method, adherend recovery apparatus, gas-generating film and resin composition | JSR CORPORATION (JP) | 2019-09-17 | — | — | US | disclosed |
| EP-3040411-B1 | ADHEREND RECOVERY METHOD AND ADHEREND RECOVERY DEVICE | JSR CORP (JP) | 2019-07-03 | — | — | EP | disclosed |
| US-10095110-B2 | Photosensitive resin composition, method for forming resist pattern, and method for producing metallic pattern | JSR CORPORATION (JP) | 2018-10-09 | — | — | US | disclosed |
| EP-2123720-B1 | CURABLE COMPOSITION | KANEKA CORP (JP) | 2017-06-14 | — | — | EP | disclosed |
| US-20170153543-A1 | PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR FORMING RESIST PATTERN, AND METHOD FOR PRODUCING METALLIC PATTERN | JSR CORPORATION (JP) | 2017-06-01 | — | — | US | disclosed |
| EP-0899287-B1 | Multi-branched compounds and curable composition | TOYO INK MFG CO (JP) | 2005-01-19 | — | — | EP | disclosed |
| EP-0967523-B1 | Photosensitive resin composition, method for producing photosensitive resin compsition, and printing plate material | TORAY INDUSTRIES (JP) | 2003-03-19 | — | — | EP | disclosed |
| EP-1146061-A1 | MICHAEL ADDITION TYPE URETHANE-UREA RESIN, PROCESS FOR PRODUCING THE SAME, PRESSURE-SENSITIVE ADHESIVE, PROCESS FOR PRODUCING THE SAME, COATING MATERIAL FOR FORMING INK-RECEIVING LAYER, AND RECORDING MATERIAL | Toyo Ink Manufacturing Co. Ltd. (JP) | 2001-10-17 | — | — | EP | disclosed |
| US-6187897-B1 | USEFUL IN COATING AND PRINTING; CURABLE BY ANY ONE OF CONVENTIONAL TRIGGERS SUCH AS HEATING, ULTRAVIOLET LIGHT, INFRARED LIGHT, ELECTRON BEAMS AND GAMMA RAYS | TOYO INK MANUFACTURING CO., LTD. (JP) | 2001-02-13 | — | — | US | disclosed |
| US-6136943-A | HIGH MOLECULAR WEIGHT, LOW VISCOSITY COATINGS; REACTION PRODUCT OF POLYAMINE, (METH)ACRYLIC COMPOUND AND VINYL COMPOUND; MICHAEL CONDENSATION | TOYO INK MFG. CO., LTD. (JP) | 2000-10-24 | — | — | US | disclosed |
| US-6048953-A | CURABLE (METH)ACRYLIC POLYMER OR COPOLYMER WITH AVERAGE MOLECULAR WEIGHT OF 1000 OR LESS | TOYO INK MANUFACTURING CO., LTD. (JP) | 2000-04-11 | — | — | US | disclosed |
| EP-0967523-A1 | Photosensitive resin composition, method for producing photosensitive resin compsition, and printing plate material | TORAY INDUSTRIES, INC. (JP) | 1999-12-29 | — | — | EP | disclosed |
| EP-0899287-A1 | Multi-branched compounds and curable composition | TOYO INK MFG. CO., LTD. (JP) | 1999-03-03 | — | — | EP | disclosed |
| EP-0899286-A1 | Vinyl-group-containing dendrimer and curable composition | TOYO INK MANUFACTURING CO., LTD. (JP) | 1999-03-03 | — | — | EP | disclosed |
| EP-0842960-A1 | CURABLE LIQUID RESIN COMPOSITION | TOYO INK MANUFACTURING CO., LTD. (JP) | 1998-05-20 | — | — | EP | disclosed |