SCHEMBL10014096

SCHEMBL10014096

CC(CC(=O)OCC(=O)OC(C)(C)C)C1CCC2C3CCC4CC(O)CCC4(C)C3CC(O)C12C

nearest known ligand 0.64

Predicted protein targets (top 17)

geneUniProtsupporting neighboursconfidence
▸ MAPT P10636 2/20 0.64
▸ MEN1 O00255 1/20 0.64
▸ KMT2A Q03164 1/20 0.64
▸ USP2 O75604 1/20 0.64
▸ LMNA P02545 1/20 0.64
▸ MAPK1 P28482 1/20 0.64
▸ GPBAR1 Q8TDU6 7/20 0.62
▸ SLC10A2 Q12908 2/20 0.62
▸ NR1H4 Q96RI1 2/20 0.62
▸ TBXA2R P21731 1/20 0.62
▸ PDE3A Q14432 1/20 0.62
▸ CA1 P00915 9/20 0.54
▸ CA2 P00918 9/20 0.54
▸ ABCC4 O15439 1/20 0.53
▸ CYP2C9 P11712 1/20 0.49
▸ HIF1A Q16665 1/20 0.49
▸ VDR P11473 1/20 0.49

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL133837 0.92 MAPT (0.75) MAPTMEN1KMT2AUSP2LMNA
SCHEMBL16343769 0.92 MAPT (0.75) MAPTMEN1KMT2AUSP2LMNA
SCHEMBL8736223 0.92 MAPT (0.75) MAPTMEN1KMT2AUSP2LMNA
SCHEMBL17320288 0.92 MAPT (0.75) MAPTMEN1KMT2AUSP2LMNA
SCHEMBL16190063 0.89 GPBAR1 (0.67) MAPTUSP2LMNAMAPK1GPBAR1
SCHEMBL17311845 0.89 GPBAR1 (0.67) MAPTUSP2LMNAMAPK1GPBAR1
SCHEMBL8736941 0.87 MAPT (0.81) MAPTMEN1KMT2AUSP2LMNA
SCHEMBL133225 0.87 MAPT (0.81) MAPTMEN1KMT2AUSP2LMNA
SCHEMBL17090568 0.87 MAPT (0.69) MAPTMEN1KMT2AUSP2LMNA
SCHEMBL18575733 0.82 GPBAR1 (0.74) MAPTUSP2LMNAMAPK1GPBAR1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9329478-B2 Polysiloxane composition and pattern-forming method JSR CORPORATION (JP) 2016-05-03 — — US disclosed
US-9329478-B2 Polysiloxane composition and pattern-forming method JSR CORPORATION (JP) 2016-05-03 — — US disclosed
US-20130130179-A1 POLYSILOXANE COMPOSITION AND PATTERN-FORMING METHOD JSR CORPORATION (JP) 2013-05-23 — — US disclosed
US-20130130179-A1 POLYSILOXANE COMPOSITION AND PATTERN-FORMING METHOD JSR CORPORATION (JP) 2013-05-23 — — US disclosed
WO-2012008538-A1 POLYSILOXANE COMPOSITION AND METHOD OF PATTERN FORMATION JSR株式会社 (JP) 2012-01-19 — — WO disclosed
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