Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | MAPT | P10636 | 2/20 | 0.75 |
| ▸ | MEN1 | O00255 | 2/20 | 0.75 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.75 |
| ▸ | USP2 | O75604 | 2/20 | 0.75 |
| ▸ | LMNA | P02545 | 1/20 | 0.75 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.75 |
| ▸ | GPBAR1 | Q8TDU6 | 9/20 | 0.70 |
| ▸ | SLC10A2 | Q12908 | 2/20 | 0.70 |
| ▸ | TBXA2R | P21731 | 1/20 | 0.70 |
| ▸ | PDE3A | Q14432 | 1/20 | 0.70 |
| ▸ | NR1H4 | Q96RI1 | 1/20 | 0.70 |
| ▸ | CA1 | P00915 | 5/20 | 0.64 |
| ▸ | CA2 | P00918 | 5/20 | 0.64 |
| ▸ | ABCC4 | O15439 | 1/20 | 0.60 |
| ▸ | CYP2C9 | P11712 | 1/20 | 0.59 |
| ▸ | HIF1A | Q16665 | 1/20 | 0.59 |
| ▸ | VDR | P11473 | 1/20 | 0.59 |
| ▸ | CYP3A4 | P08684 | 2/20 | 0.57 |
| ▸ | SLCO1B3 | Q9NPD5 | 1/20 | 0.57 |
| ▸ | SLCO1B1 | Q9Y6L6 | 1/20 | 0.57 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL16343769 | 1.00 | MAPT (0.75) | MAPTMEN1KMT2AUSP2LMNA | |
| SCHEMBL133837 | 1.00 | MAPT (0.75) | MAPTMEN1KMT2AUSP2LMNA | |
| SCHEMBL17320288 | 1.00 | MAPT (0.75) | MAPTMEN1KMT2AUSP2LMNA | |
| SCHEMBL8736941 | 0.94 | MAPT (0.81) | MAPTMEN1KMT2AUSP2LMNA | |
| SCHEMBL133225 | 0.94 | MAPT (0.81) | MAPTMEN1KMT2AUSP2LMNA | |
| SCHEMBL10014096 | 0.92 | MAPT (0.64) | MAPTMEN1KMT2AUSP2LMNA | |
| SCHEMBL5435224 | 0.91 | MAPT (0.88) | MAPTMEN1KMT2AUSP2LMNA | |
| SCHEMBL14357794 | 0.90 | MAPT (0.61) | MAPTMEN1KMT2AUSP2LMNA | |
| SCHEMBL14357785 | 0.90 | MAPT (0.61) | MAPTMEN1KMT2AUSP2LMNA | |
| SCHEMBL5442896 | 0.90 | MAPT (0.77) | MAPTMEN1KMT2AUSP2LMNA |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 28 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-2414896-B1 | ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION AND PATTERN FORMING METHOD USING THE SAME | FUJIFILM CORP (JP) | 2020-11-11 | — | — | EP | disclosed |
| EP-2356516-B1 | ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION AND PATTERN FORMING METHOD USING THE COMPOSITION | FUJIFILM CORP (JP) | 2017-10-25 | — | — | EP | disclosed |
| US-20160209747-A1 | ACTIVE LIGHT SENSITIVE OR RADIATION SENSITIVE COMPOSITION, AND RESIST FILM, PATTERN FORMING METHOD, RESIST-COATED MASK BLANK, METHOD FOR PRODUCING PHOTOMASK, PHOTOMASK, METHOD FOR MANUFACTURING ELECTRONIC DEVICE, AND ELECTRONIC DEVICE, EACH OF WHICH USES SAID ACTIVE LIGHT SENSITIVE OR RADIATION SENSITIVE COMPOSITION | FUJIFILM CORPORATION (JP) | 2016-07-21 | — | — | US | disclosed |
| US-20160209747-A1 | ACTIVE LIGHT SENSITIVE OR RADIATION SENSITIVE COMPOSITION, AND RESIST FILM, PATTERN FORMING METHOD, RESIST-COATED MASK BLANK, METHOD FOR PRODUCING PHOTOMASK, PHOTOMASK, METHOD FOR MANUFACTURING ELECTRONIC DEVICE, AND ELECTRONIC DEVICE, EACH OF WHICH USES SAID ACTIVE LIGHT SENSITIVE OR RADIATION SENSITIVE COMPOSITION | FUJIFILM CORPORATION (JP) | 2016-07-21 | — | — | US | disclosed |
| US-9152048-B2 | Actinic-ray- or radiation-sensitive resin composition and method of forming pattern using the composition | FUJIFILM CORPORATION (JP) | 2015-10-06 | — | — | US | disclosed |
| US-9152048-B2 | Actinic-ray- or radiation-sensitive resin composition and method of forming pattern using the composition | FUJIFILM CORPORATION (JP) | 2015-10-06 | — | — | US | disclosed |
| US-8846290-B2 | Actinic ray-sensitive or radiation-sensitive resin composition and pattern forming method using the same | FUJIFILM CORPORATION (JP) | 2014-09-30 | — | — | US | disclosed |
| US-8846290-B2 | Actinic ray-sensitive or radiation-sensitive resin composition and pattern forming method using the same | FUJIFILM CORPORATION (JP) | 2014-09-30 | — | — | US | disclosed |
| US-8795944-B2 | Actinic ray-sensitive or radiation-sensitive resin composition and pattern forming method using the composition | FUJIFILM CORPORATION (JP) | 2014-08-05 | — | — | US | disclosed |
| US-8795944-B2 | Actinic ray-sensitive or radiation-sensitive resin composition and pattern forming method using the composition | FUJIFILM CORPORATION (JP) | 2014-08-05 | — | — | US | disclosed |
| US-20110236828-A1 | ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION AND PATTERN FORMING METHOD USING THE SAME | FUJIFILM CORPORATION (JP) | 2011-09-29 | — | — | US | disclosed |
| US-20110236828-A1 | ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION AND PATTERN FORMING METHOD USING THE SAME | FUJIFILM CORPORATION (JP) | 2011-09-29 | — | — | US | disclosed |
| US-20110091809-A1 | ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD OF FORMING PATTERN USING THE COMPOSITION | FUJIFILM CORPORATION (JP) | 2011-04-21 | — | — | US | disclosed |
| US-20110091809-A1 | ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD OF FORMING PATTERN USING THE COMPOSITION | FUJIFILM CORPORATION (JP) | 2011-04-21 | — | — | US | disclosed |
| WO-2011024734-A1 | ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, AND RESIST FILM AND PATTERN FORMING METHOD USING THE SAME | FUJIFILM CORPORATION (JP) | 2011-03-03 | — | — | WO | disclosed |
| WO-2010114107-A1 | ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION AND PATTERN FORMING METHOD USING THE SAME | FUJIFILM CORPORATION (JP) | 2010-10-07 | — | — | WO | disclosed |
| US-20100183980-A1 | ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION AND PATTERN FORMING METHOD USING THE SAME | FUJIFILM CORPORATION (JP) | 2010-07-22 | — | — | US | disclosed |
| US-20100183980-A1 | ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION AND PATTERN FORMING METHOD USING THE SAME | FUJIFILM CORPORATION (JP) | 2010-07-22 | — | — | US | disclosed |
| WO-2010067898-A2 | ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION AND PATTERN FORMING METHOD USING THE COMPOSITION | FUJIFILM CORPORATION (JP) | 2010-06-17 | — | — | WO | disclosed |
| WO-2010067905-A2 | ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION AND PATTERN FORMING METHOD USING THE SAME | FUJIFILM CORPORATION (JP) | 2010-06-17 | — | — | WO | disclosed |