Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | MAPT | P10636 | 2/20 | 0.81 |
| ▸ | MEN1 | O00255 | 2/20 | 0.81 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.81 |
| ▸ | USP2 | O75604 | 2/20 | 0.81 |
| ▸ | MAPK1 | P28482 | 2/20 | 0.81 |
| ▸ | LMNA | P02545 | 1/20 | 0.81 |
| ▸ | GPBAR1 | Q8TDU6 | 7/20 | 0.76 |
| ▸ | SLC10A2 | Q12908 | 2/20 | 0.76 |
| ▸ | TBXA2R | P21731 | 1/20 | 0.76 |
| ▸ | PDE3A | Q14432 | 1/20 | 0.76 |
| ▸ | NR1H4 | Q96RI1 | 1/20 | 0.76 |
| ▸ | ABCC4 | O15439 | 1/20 | 0.64 |
| ▸ | CA1 | P00915 | 4/20 | 0.64 |
| ▸ | CA2 | P00918 | 4/20 | 0.64 |
| ▸ | CYP2C9 | P11712 | 1/20 | 0.64 |
| ▸ | HIF1A | Q16665 | 1/20 | 0.64 |
| ▸ | VDR | P11473 | 1/20 | 0.64 |
| ▸ | CYP3A4 | P08684 | 2/20 | 0.61 |
| ▸ | SLCO1B3 | Q9NPD5 | 1/20 | 0.61 |
| ▸ | SLCO1B1 | Q9Y6L6 | 1/20 | 0.61 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL8736941 | 1.00 | MAPT (0.81) | MAPTMEN1KMT2AUSP2MAPK1 | |
| SCHEMBL16343769 | 0.94 | MAPT (0.75) | MAPTMEN1KMT2AUSP2MAPK1 | |
| SCHEMBL133837 | 0.94 | MAPT (0.75) | MAPTMEN1KMT2AUSP2MAPK1 | |
| SCHEMBL17320288 | 0.94 | MAPT (0.75) | MAPTMEN1KMT2AUSP2MAPK1 | |
| SCHEMBL8736223 | 0.94 | MAPT (0.75) | MAPTMEN1KMT2AUSP2MAPK1 | |
| SCHEMBL2289939 | 0.91 | MAPT (0.68) | MAPTMEN1KMT2AUSP2MAPK1 | |
| Methyl Deoxycholate SCHEMBL14668286 | 0.90 | MAPT (1.00) | MAPTMEN1KMT2AUSP2MAPK1 | |
| Methyl Deoxycholate SCHEMBL21846440 | 0.90 | MAPT (1.00) | MAPTMEN1KMT2AUSP2MAPK1 | |
| Methyl Deoxycholate SCHEMBL21283695 | 0.90 | MAPT (1.00) | MAPTMEN1KMT2AUSP2MAPK1 | |
| Methyl Deoxycholate SCHEMBL21904594 | 0.90 | MAPT (1.00) | MAPTMEN1KMT2AUSP2MAPK1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 644 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-2296039-B1 | Positive photosensitive composition | FUJIFILM CORP (JP) | 2013-09-25 | — | — | EP | claimed |
| US-6180316-B1 | SUITABLE FOR USE AS CHEMICALLY AMPLIFIED RESIST USED IN MANUFACTURING OF INTEGRATED CIRCUITS | JSR CORPORATION (JP) | 2001-01-30 | — | — | US | claimed |
| CN-1267001-A | Photoetching resin composition contg cyclic olefin polymer and saturated steroid additive | IBM (US) | 2000-09-20 | — | — | CN | claimed |
| CN-113359391-B | Photoresist composition and method for forming photoresist pattern | 台湾积体电路制造股份有限公司 | 2024-09-24 | — | — | CN | disclosed |
| CN-112987515-B | Method of manufacturing semiconductor device and semiconductor device manufacturing tool | 台湾积体电路制造股份有限公司 | 2024-09-06 | — | — | CN | disclosed |
| WO-2024127808-A1 | RADIATION-SENSITIVE COMPOSITION AND METHOD FOR FORMING RESIST PATTERN | JSR株式会社 | 2024-06-20 | — | — | WO | disclosed |
| US-11971659-B2 | Photoresist composition and method of forming photoresist pattern | TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD. (TW) | 2024-04-30 | — | — | US | disclosed |
| US-11971657-B2 | Photoresist developer and method of developing photoresist | TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. (TW) | 2024-04-30 | — | — | US | disclosed |
| CN-110955112-B | Photoresist composition and method for forming photoresist pattern | 台湾积体电路制造股份有限公司 | 2024-04-26 | — | — | CN | disclosed |
| US-11966160-B2 | Radiation-sensitive resin composition and method for forming pattern | JSR CORPORATION (JP) | 2024-04-23 | — | — | US | disclosed |
| US-11966162-B2 | Photoresist composition and method of manufacturing a semiconductor device | TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. (TW) | 2024-04-23 | — | — | US | disclosed |
| EP-0880074-B1 | An energy-sensitive resist material and a process for device fabrication using an energy-sensitive resist material | LUCENT TECHNOLOGIES INC (US) | 1999-10-27 | — | — | EP | disclosed |
| EP-0930541-A1 | Radiation sensitive resin composition | JSR Corporation (JP) | 1999-07-21 | — | — | EP | disclosed |
| US-5879857-A | POLYMER, PHOTOACID GENERATOR, DISSOLUTION INHIBITOR | LUCENT TECHNOLOGIES INC. (US) | 1999-03-09 | — | — | US | disclosed |
| EP-0646568-B1 | Tertiary butyl 4,4-bis(4'-hydroxyphenyl) pentanoate derivatives and positive resist materials containing the same | SHINETSU CHEMICAL CO (JP) | 1998-12-23 | — | — | EP | disclosed |
| US-5843624-A | Energy-sensitive resist material and a process for device fabrication using an energy-sensitive resist material | LUCENT TECHNOLOGIES INC. (US) | 1998-12-01 | — | — | US | disclosed |
| EP-0880074-A1 | An energy-sensitive resist material and a process for device fabrication using an energy-sensitive resist material | LUCENT TECHNOLOGIES INC. (US) | 1998-11-25 | — | — | EP | disclosed |
| EP-0794458-A2 | An energy-sensitive resist material and a process for device fabrication using an energy-sensitive resist material | LUCENT TECHNOLOGIES INC. (US) | 1997-09-10 | — | — | EP | disclosed |
| EP-0646568-A2 | Tertiary butyl 4,4-bis(4'-hydroxyphenyl) pentanoate derivatives and positive resist materials containing the same | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 1995-04-05 | — | — | EP | disclosed |
| EP-0615163-A1 | Onium salts and positive resist materials using the same | Shin-Etsu Chemical Co., Ltd. (JP) | 1994-09-14 | — | — | EP | disclosed |