SCHEMBL10014693

SCHEMBL10014693

C=C[Si](O[Si](C=C)(C1CCCCC1)C1CCCCC1)(C1CCCCC1)C1CCCCC1

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL15915907 0.97
SCHEMBL1314591 0.81
SCHEMBL19952890 0.79
SCHEMBL19953084 0.78
SCHEMBL19953167 0.76
SCHEMBL1315001 0.76
SCHEMBL1314660 0.76
SCHEMBL93991 0.75
SCHEMBL1314107 0.73
SCHEMBL1313978 0.72 NFE2L2 (0.33)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 17 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9970103-B2 Film deposition material, sealing film using the same and use thereof TOSOH CORPORATION (JP) 2018-05-15 US disclosed
US-9695301-B2 Nanoparticle, method for producing nanoparticle, addition curing silicone resin composition, and semiconductor apparatus SHIN-ETSU CHEMICAL CO., LTD. (JP) 2017-07-04 US disclosed
US-9695301-B2 Nanoparticle, method for producing nanoparticle, addition curing silicone resin composition, and semiconductor apparatus SHIN-ETSU CHEMICAL CO., LTD. (JP) 2017-07-04 US disclosed
US-20160355671-A1 NANOPARTICLE, METHOD FOR PRODUCING NANOPARTICLE, ADDITION CURING SILICONE RESIN COMPOSITION, AND SEMICONDUCTOR APPARATUS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2016-12-08 US disclosed
US-20160355671-A1 NANOPARTICLE, METHOD FOR PRODUCING NANOPARTICLE, ADDITION CURING SILICONE RESIN COMPOSITION, AND SEMICONDUCTOR APPARATUS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2016-12-08 US disclosed
US-20160326642-A1 FILM DEPOSITION MATERIAL, SEALING FILM USING THE SAME AND USE THEREOF TOSOH CORPORATION (JP) 2016-11-10 US disclosed
US-20160185912-A1 CURABLE SILICONE RESIN COMPOSITION SHIN-ETSU CHEMICAL CO., LTD. (JP) 2016-06-30 US disclosed
US-20160185912-A1 CURABLE SILICONE RESIN COMPOSITION SHIN-ETSU CHEMICAL CO., LTD. (JP) 2016-06-30 US disclosed
US-20140219903-A1 FILM DEPOSITION MATERIAL, SEALING FILM USING THE SAME AND USE THEREOF TOSOH CORPORATION (JP) 2014-08-07 US disclosed
US-8791213-B2 Curable silicone resin composition SHIN-ETSU CHEMICAL CO., LTD. (JP) 2014-07-29 US disclosed
US-8791213-B2 Curable silicone resin composition SHIN-ETSU CHEMICAL CO., LTD. (JP) 2014-07-29 US disclosed
US-20140024796-A1 CURABLE SILICONE RESIN COMPOSITION SHIN-ETSU CHEMICAL CO., LTD. (JP) 2014-01-23 US disclosed
US-20140024796-A1 CURABLE SILICONE RESIN COMPOSITION SHIN-ETSU CHEMICAL CO., LTD. (JP) 2014-01-23 US disclosed
US-8168730-B2 Curable silicone rubber composition and cured product thereof SHIN-ETSU CHEMICAL CO., LTD. (JP) 2012-05-01 US disclosed
US-7989574-B2 Curable silicone rubber composition and cured product thereof SHIN-ETSU CHEMICAL CO., LTD. (JP) 2011-08-02 US disclosed
US-20080015326-A1 CURABLE SILICONE RUBBER COMPOSITION AND CURED PRODUCT THEREOF SHIN -ETSU CHEMICAL CO., LTD. (JP) 2008-01-17 US disclosed
US-20070166470-A1 CURABLE SILICONE RUBBER COMPOSITION AND CURED PRODUCT THEREOF SHIN-ETSU CHEMICAL CO., LTD. (JP) 2007-07-19 US disclosed