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Sugi Predict / Compounds / SCHEMBL10018481

SCHEMBL10018481

SCHEMBL10018481

CCCCCC(C)N1C(=O)c2ccc3c4c(ccc(c24)C1=O)C(=O)N(C)C3=O

nearest known ligand 0.39

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ SHMT2 P34897 1/20 0.39
▸ SMN1; SMN2 Q16637 3/20 0.39
▸ HSD17B10 Q99714 2/20 0.39
▸ HTT P42858 2/20 0.39
▸ PKM P14618 1/20 0.39
▸ PRMT1 Q99873 1/20 0.37
▸ ALDH1A1 P00352 4/20 0.36
▸ LMNA P02545 2/20 0.36
▸ CYP2C19 P33261 1/20 0.36
▸ TERT O14746 3/20 0.36
▸ TDP1 Q9NUW8 1/20 0.36
▸ MEN1 O00255 5/20 0.36
▸ KMT2A Q03164 5/20 0.36
▸ HPGD P15428 2/20 0.36
▸ KDM4E B2RXH2 2/20 0.36
▸ USP2 O75604 2/20 0.36
▸ KEAP1 Q14145 2/20 0.36
▸ NFE2L2 Q16236 2/20 0.36
▸ MAPT P10636 1/20 0.36
▸ MAPK1 P28482 1/20 0.36

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL13285164 0.96 SHMT2 (0.37) SHMT2SMN1; SMN2HSD17B10HTTPKM
SCHEMBL14156553 0.94 STAT3 (0.42) SHMT2SMN1; SMN2HSD17B10HTTPKM
SCHEMBL12132256 0.94 TDP1 (0.40) SHMT2SMN1; SMN2HSD17B10HTTPKM
SCHEMBL412569 0.89 SHMT2 (0.37) SHMT2SMN1; SMN2HSD17B10HTTPKM
SCHEMBL13259586 0.89 SHMT2 (0.37) SHMT2SMN1; SMN2HSD17B10HTTPKM
SCHEMBL13929184 0.88 SHMT2 (0.38) SHMT2SMN1; SMN2HSD17B10HTTPKM
SCHEMBL12576925 0.88 STAT3 (0.42) SHMT2SMN1; SMN2HSD17B10HTTPKM
SCHEMBL10018461 0.88 SMN1; SMN2 (0.39) SHMT2SMN1; SMN2HSD17B10HTTPKM
SCHEMBL10018465 0.88 SMN1; SMN2 (0.39) SHMT2SMN1; SMN2HSD17B10HTTPKM
SCHEMBL12499971 0.88 STAT3 (0.42) SHMT2SMN1; SMN2HSD17B10HTTPKM

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 8 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9012112-B2 Electrophotographic photosensitive member, process cartridge, and electrophotographic apparatus CANON KABUSHIKI KAISHA (JP) 2015-04-21 — — US disclosed
US-9012112-B2 Electrophotographic photosensitive member, process cartridge, and electrophotographic apparatus CANON KABUSHIKI KAISHA (JP) 2015-04-21 — — US disclosed
US-8192905-B2 Electrophotographic photoconductor, image forming apparatus, and process cartridge RICOH COMPANY, LTD. (JP) 2012-06-05 — — US disclosed
US-8192905-B2 Electrophotographic photoconductor, image forming apparatus, and process cartridge RICOH COMPANY, LTD. (JP) 2012-06-05 — — US disclosed
US-8114559-B2 A conductive substrate, a photosensitive layer of a charge generation material of titanyl phthalocyanine, a pyrene diimide electron transport material, substituted triphenylamine hole transport material RICOH COMPANY, LTD. (JP) 2012-02-14 — — US disclosed
US-8114559-B2 A conductive substrate, a photosensitive layer of a charge generation material of titanyl phthalocyanine, a pyrene diimide electron transport material, substituted triphenylamine hole transport material RICOH COMPANY, LTD. (JP) 2012-02-14 — — US disclosed
US-7919220-B2 Electroconductive substrate; photosensitive charge generation material and electron transport material in single layer; wherein titanylphthalocyanine is converted; charger; irradiator to form electrostatic latent image; developer to form toner image; high sensitivity, stably charged, no residual images RICOH COMPANY, LTD. (JP) 2011-04-05 — — US disclosed
US-7919220-B2 Electroconductive substrate; photosensitive charge generation material and electron transport material in single layer; wherein titanylphthalocyanine is converted; charger; irradiator to form electrostatic latent image; developer to form toner image; high sensitivity, stably charged, no residual images RICOH COMPANY, LTD. (JP) 2011-04-05 — — US disclosed