Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | NQO1 | P15559 | 1/20 | 0.64 |
| ▸ | CYP3A4 | P08684 | 3/20 | 0.57 |
| ▸ | CYP2D6 | P10635 | 3/20 | 0.57 |
| ▸ | ALDH1A1 | P00352 | 5/20 | 0.53 |
| ▸ | SMN1; SMN2 | Q16637 | 5/20 | 0.53 |
| ▸ | KDM4E | B2RXH2 | 4/20 | 0.53 |
| ▸ | LTA4H | P09960 | 1/20 | 0.53 |
| ▸ | TSHR | P16473 | 1/20 | 0.52 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.52 |
| ▸ | CYP1A2 | P05177 | 2/20 | 0.52 |
| ▸ | CYP19A1 | P11511 | 2/20 | 0.52 |
| ▸ | CYP2C9 | P11712 | 2/20 | 0.52 |
| ▸ | CYP2C19 | P33261 | 2/20 | 0.52 |
| ▸ | ACACB | O00763 | 1/20 | 0.51 |
| ▸ | ACACA | Q13085 | 1/20 | 0.51 |
| ▸ | RAB9A | P51151 | 5/20 | 0.50 |
| ▸ | NPC1 | O15118 | 4/20 | 0.50 |
| ▸ | HPGD | P15428 | 2/20 | 0.50 |
| ▸ | HSD17B10 | Q99714 | 2/20 | 0.50 |
| ▸ | GAA | P10253 | 2/20 | 0.50 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL9152649 | 0.93 | CYP3A4 (0.63) | CYP3A4CYP2D6ALDH1A1SMN1; SMN2KDM4E | |
| SCHEMBL6836988 | 0.93 | CYP3A4 (0.63) | CYP3A4CYP2D6ALDH1A1SMN1; SMN2KDM4E | |
| SCHEMBL17108413 | 0.93 | CYP3A4 (0.63) | CYP3A4CYP2D6ALDH1A1SMN1; SMN2KDM4E | |
| 4-Ethoxy-1-Propoxybenzene SCHEMBL2841577 | 0.93 | NQO1 (0.74) | NQO1CYP2D6ALDH1A1SMN1; SMN2KDM4E | |
| SCHEMBL10022022 | 0.88 | CYP2D6 (0.70) | CYP3A4CYP2D6SMN1; SMN2KDM4ELTA4H | |
| SCHEMBL18417193 | 0.88 | NQO1 (0.82) | NQO1CYP3A4CYP2D6ALDH1A1SMN1; SMN2 | |
| SCHEMBL9155582 | 0.88 | NQO1 (0.82) | NQO1CYP3A4CYP2D6ALDH1A1SMN1; SMN2 | |
| SCHEMBL5833291 | 0.88 | NQO1 (0.82) | NQO1CYP3A4CYP2D6ALDH1A1SMN1; SMN2 | |
| SCHEMBL12972522 | 0.88 | KDM4E (0.56) | NQO1CYP3A4CYP2D6ALDH1A1SMN1; SMN2 | |
| SCHEMBL10027327 | 0.86 | LTA4H (0.70) | NQO1ALDH1A1SMN1; SMN2KDM4ELTA4H |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 32 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9104101-B2 | Resist composition, method of forming resist pattern and polymeric compound | TOKYO OHKA KOGYO CO., LTD. (JP) | 2015-08-11 | — | — | US | disclosed |
| US-9104101-B2 | Resist composition, method of forming resist pattern and polymeric compound | TOKYO OHKA KOGYO CO., LTD. (JP) | 2015-08-11 | — | — | US | disclosed |
| US-8574809-B2 | Positive resist composition and method of forming resist pattern | TOKYO OHKA KOGYO CO., LTD. (JP) | 2013-11-05 | — | — | US | disclosed |
| US-8574809-B2 | Positive resist composition and method of forming resist pattern | TOKYO OHKA KOGYO CO., LTD. (JP) | 2013-11-05 | — | — | US | disclosed |
| US-8536280-B2 | Star polymer and coupling agent for anionic polymerization | TOHO CHEMICAL INDUSTRY CO., LTD. (JP) | 2013-09-17 | — | — | US | disclosed |
| US-20120282551-A1 | RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN AND POLYMERIC COMPOUND | TOKYO OHKA KOGYO CO., LTD. (JP) | 2012-11-08 | — | — | US | disclosed |
| US-20120282551-A1 | RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN AND POLYMERIC COMPOUND | TOKYO OHKA KOGYO CO., LTD. (JP) | 2012-11-08 | — | — | US | disclosed |
| US-8193286-B2 | Acrylic star polymer | NIPPON SODA CO., LTD. (JP) | 2012-06-05 | — | — | US | disclosed |
| US-8193286-B2 | Acrylic star polymer | NIPPON SODA CO., LTD. (JP) | 2012-06-05 | — | — | US | disclosed |
| US-8067515-B2 | Method of producing an acrylic acid-based polymer | NIPPON SODA CO., LTD. (JP) | 2011-11-29 | — | — | US | disclosed |
| US-20090253075-A1 | POSITIVE RESIST COMPOSITION, AND METHOD OF FORMING RESIST PATTERN | TOKYO OHKA KOGYO CO., LTD. (JP) | 2009-10-08 | — | — | US | disclosed |
| US-20090253075-A1 | POSITIVE RESIST COMPOSITION, AND METHOD OF FORMING RESIST PATTERN | TOKYO OHKA KOGYO CO., LTD. (JP) | 2009-10-08 | — | — | US | disclosed |
| US-20090209726-A1 | ACRYLIC STAR POLYMER | NIPPON SODA CO., LTD. (JP) | 2009-08-20 | — | — | US | disclosed |
| US-20090209726-A1 | ACRYLIC STAR POLYMER | NIPPON SODA CO., LTD. (JP) | 2009-08-20 | — | — | US | disclosed |
| US-20090111961-A1 | Acrylic Acid-Based Polymer and Method of Producing the Same | NIPPON SODA CO., LTD. (JP) | 2009-04-30 | — | — | US | disclosed |
| US-20090111961-A1 | Acrylic Acid-Based Polymer and Method of Producing the Same | NIPPON SODA CO., LTD. (JP) | 2009-04-30 | — | — | US | disclosed |
| US-7494759-B2 | Positive resist compositions and process for the formation of resist patterns with the same | TOKYO OHKA KOGYO CO., LTD. (JP) | 2009-02-24 | — | — | US | disclosed |
| US-7494759-B2 | Positive resist compositions and process for the formation of resist patterns with the same | TOKYO OHKA KOGYO CO., LTD. (JP) | 2009-02-24 | — | — | US | disclosed |
| US-20070224538-A1 | Positive Resist Compositions and Process for the Formation of Resist Patterns With the Same | TOKYO OHKA KOGYO CO., LTD. (JP) | 2007-09-27 | — | — | US | disclosed |
| US-20070224538-A1 | Positive Resist Compositions and Process for the Formation of Resist Patterns With the Same | TOKYO OHKA KOGYO CO., LTD. (JP) | 2007-09-27 | — | — | US | disclosed |