SCHEMBL1002862

SCHEMBL1002862

CO[Si]([Si](C)(C)C)([Si](C)(C)C)[Si](C)(C)C

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2353494 0.67
SCHEMBL4199698 0.67
SCHEMBL28152 0.64
SCHEMBL31316938 0.64
SCHEMBL1405545 0.64
SCHEMBL996457 0.64
SCHEMBL35033 0.60
SCHEMBL479251 0.60
SCHEMBL18010451 0.60
SCHEMBL5696436 0.60

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 10 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7727901-B2 Preparation of group IV semiconductor nanoparticle materials and dispersions thereof INNOVALIGHT, INC. (US) 2010-06-01 US claimed
US-8420517-B2 Methods of forming a multi-doped junction with silicon-containing particles INNOVALIGHT, INC. (US) 2013-04-16 US disclosed
US-8288176-B2 Method for manufacturing a photovoltaic cell INNOVALIGHT, INC. (US) 2012-10-16 US disclosed
US-8048814-B2 Methods and apparatus for aligning a set of patterns on a silicon substrate INNOVALIGHT, INC. (US) 2011-11-01 US disclosed
US-20110003465-A1 Methods of forming a multi-doped junction with silicon-containing particles INNOVALIGHT, INC. 2011-01-06 US disclosed
US-7727901-B2 Preparation of group IV semiconductor nanoparticle materials and dispersions thereof INNOVALIGHT, INC. (US) 2010-06-01 US disclosed
US-7572740-B2 Methods for optimizing thin film formation with reactive gases INNOVALIGHT, INC. (US) 2009-08-11 US disclosed
US-20090107359-A1 PREPARATION OF GROUP IV SEMICONDUCTOR NANOPARTICLE MATERIALS AND DISPERSIONS THEREOF INNOVALIGHT, INC. 2009-04-30 US disclosed
US-20090053878-A1 METHOD FOR FABRICATION OF SEMICONDUCTOR THIN FILMS USING FLASH LAMP PROCESSING INNOVALIGHT, INC. 2009-02-26 US disclosed
US-20080254601-A1 METHODS FOR OPTIMIZING THIN FILM FORMATION WITH REACTIVE GASES INNOVALIGHT, INC. 2008-10-16 US disclosed