⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Ethane SCHEMBL28197216 | 0.96 | — | — | |
| SCHEMBL28161849 | 0.92 | — | — | |
| SCHEMBL479251 | 0.80 | — | — | |
| SCHEMBL17831223 | 0.72 | — | — | |
| SCHEMBL10991579 | 0.70 | — | — | |
| SCHEMBL1271765 | 0.70 | — | — | |
| SCHEMBL247770 | 0.70 | — | — | |
| SCHEMBL645481 | 0.70 | — | — | |
| SCHEMBL17973726 | 0.67 | — | — | |
| SCHEMBL4199698 | 0.67 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 46 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-1029043-C | Method for forming photosensitive film and imaging on substrate | IBM (US) | 1995-06-21 | — | — | CN | claimed |
| EP-0382932-B1 | Process for the vapor deposition of polysilanes | IBM (US) | 1994-11-09 | — | — | EP | claimed |
| US-5173452-A | Process for the vapor deposition of polysilanes photoresists | DOBUZINSKY DAVID M (US) | 1992-12-22 | — | — | US | claimed |
| CN-1044995-A | The steam of polysilane amasss attached method | IBM (US) | 1990-08-29 | — | — | CN | claimed |
| EP-0382932-A2 | Process for the vapor deposition of polysilanes | International Business Machines Corporation (US) | 1990-08-22 | — | — | EP | claimed |
| JP-2263981-A | — | — | None | — | — | JP | disclosed |
| US-20160193572-A1 | Novel Flux Enhancing Agent for Improving Composite Polyamide Reverse Osmosis Membrane Performance | BL TECHNOLOGIES, INC. | 2016-07-07 | — | — | US | disclosed |
| US-8198016-B2 | Patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2012-06-12 | — | — | US | disclosed |
| US-7872053-B2 | Surface active organosilicone compounds | Momentive Performance Materials GmbH & Co., KG (DE) | 2011-01-18 | — | — | US | disclosed |
| US-RE41799-E1 | Coating composition for glass | ARKEMA INC. (US) | 2010-10-05 | — | — | US | disclosed |
| EP-2125832-A1 | SURFACE ACTIVE ORGANOSILICONE COMPOUNDS | Momentive Performance Materials GmbH (DE) | 2009-12-02 | — | — | EP | disclosed |
| US-20090286188-A1 | Patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2009-11-19 | — | — | US | disclosed |
| JP-H02263981-A | FORMATION OF FILM | INTERNATL BUSINESS MACH CORP <IBM> | 1990-10-26 | — | — | JP | disclosed |
| CN-1044995-A | The steam of polysilane amasss attached method | IBM (US) | 1990-08-29 | — | — | CN | disclosed |
| EP-0382932-A2 | Process for the vapor deposition of polysilanes | International Business Machines Corporation (US) | 1990-08-22 | — | — | EP | disclosed |
| US-4730055-A | Method for silylating aromatic imides and silylimides made therefrom | GENERAL ELECTRIC COMPANY (US) | 1988-03-08 | — | — | US | disclosed |
| US-4395562-A | FROM ALKYL ALLENE AND A DISILANE IN PRESENCE OF PHOSPHINE COMPLEX OF A TRANSITION METAL | CHISSO CORPORATION (JP) | 1983-07-26 | — | — | US | disclosed |
| US-4386117-A | CHEMICAL VAPOR DEPOSITION | GORDON ROY G | 1983-05-31 | — | — | US | disclosed |
| US-4386117-A | CHEMICAL VAPOR DEPOSITION | GORDON ROY G | 1983-05-31 | — | — | US | disclosed |
| WO-1983001750-A1 | COATING PROCESS USING ALKOXY SUBSTITUTED SILICON-BEARING REACTANT | GORDON, ROY, GERALD | 1983-05-26 | — | — | WO | disclosed |