SCHEMBL10033040

SCHEMBL10033040

CCC(C)(CC(C)(CC(C)(CC(C)(C)C(=O)OCC1CO1)C(=O)O)C(=O)OC)C(=O)OCc1ccccc1

nearest known ligand 0.39

Predicted protein targets (top 8)

geneUniProtsupporting neighboursconfidence
MGLL Q99685 5/20 0.39
PTPN1 P18031 1/20 0.36
MEN1 O00255 1/20 0.35
KMT2A Q03164 1/20 0.35
HTT P42858 1/20 0.34
PREP P48147 1/20 0.34
KLK7 P49862 1/20 0.34
KLK5 Q9Y337 1/20 0.34

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL27045609 0.97 MGLL (0.41) MGLLPTPN1MEN1KMT2AHTT
SCHEMBL12640334 0.93 MGLL (0.41) MGLL
SCHEMBL12756291 0.92 MGLL (0.44) MGLL
SCHEMBL14076815 0.91 MGLL (0.42) MGLL
SCHEMBL14076811 0.87 MGLL (0.39) MGLL
SCHEMBL9880804 0.85 KMT2A (0.43) PTPN1MEN1KMT2AHTT
SCHEMBL12640335 0.83 MGLL (0.36) MGLLPREP
SCHEMBL10033038 0.82 KMT2A (0.44) PTPN1MEN1KMT2A
SCHEMBL16706567 0.82 ALDH1A1 (0.46) MEN1KMT2A
SCHEMBL16706570 0.82 ALDH1A1 (0.46) MEN1KMT2A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8092981-B2 Negative photoresist composition and method of manufacturing array substrate using the same SAMSUNG ELECTRONICS CO., LTD. (KR) 2012-01-10 US disclosed
US-20090176337-A1 NEGATIVE PHOTORESIST COMPOSITION AND METHOD OF MANUFACTURING ARRAY SUBSTRATE USING THE SAME SAMSUNG ELECTRONICS CO., LTD. (KR) 2009-07-09 US disclosed