Predicted protein targets (top 13)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | NAAA | Q02083 | 2/20 | 0.73 |
| ▸ | EPHX1 | P07099 | 2/20 | 0.53 |
| ▸ | HTT | P42858 | 2/20 | 0.51 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.50 |
| ▸ | CYP19A1 | P11511 | 2/20 | 0.45 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.45 |
| ▸ | ALDH1A1 | P00352 | 5/20 | 0.44 |
| ▸ | KDM4E | B2RXH2 | 2/20 | 0.43 |
| ▸ | HPGD | P15428 | 2/20 | 0.43 |
| ▸ | LMNA | P02545 | 1/20 | 0.43 |
| ▸ | SLC18A3 | Q16572 | 1/20 | 0.40 |
| ▸ | TSHR | P16473 | 1/20 | 0.39 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.38 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL9131984 | 1.00 | NAAA (0.73) | NAAAEPHX1HTTCYP2C19CYP19A1 | |
| SCHEMBL10033782 | 1.00 | NAAA (0.73) | NAAAEPHX1HTTCYP2C19CYP19A1 | |
| SCHEMBL1695757 | 1.00 | NAAA (0.73) | NAAAEPHX1HTTCYP2C19CYP19A1 | |
| SCHEMBL397795 | 1.00 | NAAA (0.73) | NAAAEPHX1HTTCYP2C19CYP19A1 | |
| SCHEMBL1695502 | 1.00 | NAAA (0.73) | NAAAEPHX1HTTCYP2C19CYP19A1 | |
| SCHEMBL9134369 | 1.00 | NAAA (0.73) | NAAAEPHX1HTTCYP2C19CYP19A1 | |
| SCHEMBL1313739 | 0.98 | NAAA (0.71) | NAAAEPHX1HTTCYP2C19CYP19A1 | |
| SCHEMBL3291623 | 0.98 | NAAA (0.71) | NAAAEPHX1HTTCYP2C19CYP19A1 | |
| SCHEMBL4994833 | 0.98 | NAAA (0.71) | NAAAEPHX1HTTCYP2C19CYP19A1 | |
| SCHEMBL1702458 | 0.98 | NAAA (0.71) | NAAAEPHX1HTTCYP2C19CYP19A1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20120034558-A1 | PHOTOLITHOGRAPHY MATERIAL FOR IMMERSION LITHOGRAPHY PROCESSES | TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD., ("TSMC") (TW) | 2012-02-09 | — | — | US | disclosed |