SCHEMBL10034733

SCHEMBL10034733

CCCC/N=C(\C)CC(C)C

nearest known ligand 0.39

Predicted protein targets (top 19)

geneUniProtsupporting neighboursconfidence
LMNA P02545 1/20 0.39
MEN1 O00255 1/20 0.37
KMT2A Q03164 1/20 0.37
GRIN2D O15399 1/20 0.36
GRIN3B O60391 1/20 0.36
GRIN1 Q05586 1/20 0.36
GRIN2A Q12879 1/20 0.36
GRIN2B Q13224 1/20 0.36
GRIN2C Q14957 1/20 0.36
GRIN3A Q8TCU5 1/20 0.36
SIGMAR1 Q99720 1/20 0.36
ALDH1A1 P00352 1/20 0.33
TDP1 Q9NUW8 1/20 0.33
NPC1 O15118 1/20 0.32
RAB9A P51151 1/20 0.32
SMN1; SMN2 Q16637 1/20 0.32
FFAR1 O14842 1/20 0.31
HTT P42858 1/20 0.30
NOS1 P29475 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL31374751 1.00 LMNA (0.39) LMNAMEN1KMT2AGRIN2DGRIN3B
SCHEMBL21655243 0.91 MEN1 (0.48) LMNAMEN1KMT2ASIGMAR1ALDH1A1
SCHEMBL27866748 0.91 MEN1 (0.48) LMNAMEN1KMT2ASIGMAR1ALDH1A1
SCHEMBL30038765 0.91 MEN1 (0.48) LMNAMEN1KMT2ASIGMAR1ALDH1A1
SCHEMBL31448630 0.88 ALDH1A1 (0.38) ALDH1A1TDP1RAB9AHTT
SCHEMBL15365041 0.86 ALDH1A1 (0.36) ALDH1A1TDP1NPC1RAB9ASMN1; SMN2
SCHEMBL16314558 0.86 ALDH1A1 (0.36) ALDH1A1TDP1NPC1RAB9ASMN1; SMN2
SCHEMBL9950848 0.86 ALDH1A1 (0.36) MEN1KMT2AALDH1A1TDP1HTT
SCHEMBL143770 0.86 ALDH1A1 (0.36) ALDH1A1TDP1NPC1RAB9ASMN1; SMN2
SCHEMBL9950853 0.86 ALDH1A1 (0.36) MEN1KMT2AALDH1A1TDP1HTT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2012140061-A1 METHOD FOR THE PREPARATION OF SUBSTITUTED OXAZOLIDINONES SANDOZ AG (CH) 2012-10-18 WO disclosed
US-20120121932-A1 Molecular Layer Deposition Process For Making Organic Or Organic-Inorganic Polymers AIR FORCE, UNITED STATES 2012-05-17 US disclosed