Predicted protein targets (top 10)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | SLC1A3 | P43003 | 4/20 | 0.41 |
| ▸ | SLC1A2 | P43004 | 4/20 | 0.41 |
| ▸ | SLC1A1 | P43005 | 4/20 | 0.41 |
| ▸ | SHBG | P04278 | 1/20 | 0.38 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.37 |
| ▸ | CTSK | P43235 | 2/20 | 0.36 |
| ▸ | CTSL | P07711 | 1/20 | 0.36 |
| ▸ | CTSB | P07858 | 1/20 | 0.36 |
| ▸ | FFAR1 | O14842 | 1/20 | 0.33 |
| ▸ | LMNA | P02545 | 1/20 | 0.32 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL20290696 | 0.98 | SLC1A3 (0.39) | SLC1A3SLC1A2SLC1A1SHBGCYP1A2 | |
| SCHEMBL14369250 | 0.89 | — | — | |
| SCHEMBL10044211 | 0.83 | NAAA (0.34) | SLC1A3SLC1A2SLC1A1SHBGCTSK | |
| SCHEMBL15397435 | 0.83 | SLC1A3 (0.32) | SLC1A3SLC1A2SLC1A1 | |
| SCHEMBL28096588 | 0.82 | FFAR1 (0.34) | SLC1A3SLC1A2SLC1A1SHBGCTSK | |
| SCHEMBL10926690 | 0.81 | SLC1A3 (0.40) | SLC1A3SLC1A2SLC1A1CYP1A2CTSK | |
| SCHEMBL18473628 | 0.80 | CYP1A2 (0.45) | SLC1A3SLC1A2SLC1A1CYP1A2CTSK | |
| SCHEMBL10274539 | 0.79 | SLC1A3 (0.44) | SLC1A3SLC1A2SLC1A1SHBGCYP1A2 | |
| SCHEMBL11225908 | 0.79 | SLC1A3 (0.44) | SLC1A3SLC1A2SLC1A1SHBGCYP1A2 | |
| SCHEMBL18842918 | 0.79 | TDP1 (0.39) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 20 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| WO-2018112094-A1 | 1,4-THIAZINE DIOXIDE AND 1,2,4-THIADIAZINE DIOXIDE DERIVATIVES AS BETA-SECRETASE INHIBITORS AND METHODS OF USE | AMGEN INC. (US) | 2018-06-21 | — | — | WO | disclosed |
| EP-2000851-B1 | Photomask blank, resist pattern forming process, and photomask preparation process | SHINETSU CHEMICAL CO (JP) | 2015-07-29 | — | — | EP | disclosed |
| US-20150086912-A1 | ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM AND PATTERN FORMING METHOD USING THE SAME, MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE, AND SEMICONDUCTOR DEVICE | FUJIFILM CORPORATION (JP) | 2015-03-26 | — | — | US | disclosed |
| US-8343694-B2 | Photomask blank, resist pattern forming process, and photomask preparation process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2013-01-01 | — | — | US | disclosed |
| US-8343694-B2 | Photomask blank, resist pattern forming process, and photomask preparation process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2013-01-01 | — | — | US | disclosed |
| US-8124233-B2 | Anti-reflection film, and polarizing plate and image display device using the same | FUJIFILM CORPORATION (JP) | 2012-02-28 | — | — | US | disclosed |
| US-8124233-B2 | Anti-reflection film, and polarizing plate and image display device using the same | FUJIFILM CORPORATION (JP) | 2012-02-28 | — | — | US | disclosed |
| US-20090122410-A1 | ANTI-REFLECTION FILM, AND POLARIZING PLATE AND IMAGE DISPLAY DEVICE USING THE SAME | FUJIFILM CORPORATION (JP) | 2009-05-14 | — | — | US | disclosed |
| US-20090122410-A1 | ANTI-REFLECTION FILM, AND POLARIZING PLATE AND IMAGE DISPLAY DEVICE USING THE SAME | FUJIFILM CORPORATION (JP) | 2009-05-14 | — | — | US | disclosed |
| US-7498126-B2 | Photoacid generators, chemically amplified resist compositions, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2009-03-03 | — | — | US | disclosed |
| US-7494760-B2 | Photoacid generators, chemically amplified resist compositions, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2009-02-24 | — | — | US | disclosed |
| US-20080305411-A1 | PHOTOMASK BLANK, RESIST PATTERN FORMING PROCESS, AND PHOTOMASK PREPARATION PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2008-12-11 | — | — | US | disclosed |
| US-20070292768-A1 | Photoacid generators, chemically amplified resist compositions, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. | 2007-12-20 | — | — | US | disclosed |
| US-20070292768-A1 | Photoacid generators, chemically amplified resist compositions, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. | 2007-12-20 | — | — | US | disclosed |
| US-20070287096-A1 | Photoacid generators, chemically amplified resist compositions, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. | 2007-12-13 | — | — | US | disclosed |
| US-20070287096-A1 | Photoacid generators, chemically amplified resist compositions, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. | 2007-12-13 | — | — | US | disclosed |
| US-7282316-B2 | Sulfonyldiazomethane compounds, photoacid generator, resist materials and patterning using the same | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2007-10-16 | — | — | US | disclosed |
| US-7282316-B2 | Sulfonyldiazomethane compounds, photoacid generator, resist materials and patterning using the same | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2007-10-16 | — | — | US | disclosed |
| US-7250246-B2 | Positive resist composition and pattern formation method using the same | FUJIFILM CORPORATION (JP) | 2007-07-31 | — | — | US | disclosed |
| US-7250246-B2 | Positive resist composition and pattern formation method using the same | FUJIFILM CORPORATION (JP) | 2007-07-31 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20070292768-A1 | Photoacid generators, chemically amplified resist compositions, and patterning process | PTH1R, ASIC1, PPA1 | SLC1A3 2553/4885SLC1A2 2910/4885SLC1A1 3346/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.