SCHEMBL10049484

SCHEMBL10049484

CCC(C)C(=O)OC1CC2CC1CC2C(=O)O

nearest known ligand 0.34

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ HMGCR P04035 6/20 0.34
▸ SLCO1B1 Q9Y6L6 4/20 0.32
▸ KDM4E B2RXH2 2/20 0.32
▸ ABCB11 O95342 2/20 0.32
▸ LMNA P02545 2/20 0.32
▸ ITGB2 P05107 2/20 0.32
▸ ICAM1 P05362 2/20 0.32
▸ PGR P06401 2/20 0.32
▸ ABCB1 P08183 2/20 0.32
▸ CYP3A4 P08684 2/20 0.32
▸ ADORA3 P0DMS8 2/20 0.32
▸ MAPT P10636 2/20 0.32
▸ ADRB3 P13945 2/20 0.32
▸ ALOX15 P16050 2/20 0.32
▸ TSHR P16473 2/20 0.32
▸ ITGAL P20701 2/20 0.32
▸ TACR2 P21452 2/20 0.32
▸ TBXA2R P21731 2/20 0.32
▸ SLC6A2 P23975 2/20 0.32
▸ ADORA1 P30542 2/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL18845275 1.00 HMGCR (0.34) HMGCRSLCO1B1KDM4EABCB11LMNA
SCHEMBL12198853 0.81 HMGCR (0.35) HMGCRSLCO1B1KDM4EABCB11LMNA
SCHEMBL13219730 0.81 HMGCR (0.32) HMGCRSLCO1B1SLC22A8SLCO1B3
SCHEMBL13645132 0.79 HMGCR (0.31) HMGCRSLCO1B1
SCHEMBL13704489 0.79 CHRM2 (0.36) KDM4ECYP3A4TSHRSMN1; SMN2
SCHEMBL12677510 0.78 HMGCR (0.31) HMGCRSLCO1B1
SCHEMBL13704492 0.77 CHRM3 (0.35) HMGCRSLCO1B1KDM4EABCB11LMNA
SCHEMBL10033541 0.77 HMGCR (0.31) HMGCR
SCHEMBL18253410 0.77 HMGCR (0.33) HMGCRSLCO1B1KDM4EABCB11LMNA
SCHEMBL10224672 0.75 HMGCR (0.30) HMGCR

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20160147156-A1 PATTERN FORMATION METHOD, ACTIVE-LIGHT-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, METHOD FOR MANUFACTURING ELECTRONIC DEVICE, AND ELECTRONIC DEVICE FUJIFILM CORPORATION (JP) 2016-05-26 — — US disclosed
US-8202576-B2 Method of forming metal film FUJIFILM CORPORATION (JP) 2012-06-19 — — US disclosed
US-20110020755-A1 METHOD OF FORMING PATTERNS FUJIFILM CORPORATION (JP) 2011-01-27 — — US disclosed
US-20100080893-A1 METHOD OF FORMING METAL FILM FUJIFILM CORPORATION (JP) 2010-04-01 — — US disclosed
US-7598015-B2 Polymer, resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2009-10-06 — — US disclosed
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