SCHEMBL10064376

SCHEMBL10064376

C=C(CO)C(=C)OC1COC(=O)C1

nearest known ligand 0.41

Predicted protein targets (top 2)

geneUniProtsupporting neighboursconfidence
PTPN1 P18031 1/20 0.41
XPO1 O14980 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL92247 0.85 PTPN1 (0.40) PTPN1XPO1
SCHEMBL16691271 0.81 PTPN1 (0.38) PTPN1XPO1
SCHEMBL25990999 0.72 PTPN1 (0.35) PTPN1
SCHEMBL27047575 0.71 PTPN1 (0.36) PTPN1XPO1
SCHEMBL26356327 0.71 PTPN1 (0.36) PTPN1
SCHEMBL76528 0.71 ALDH1A1 (0.39) PTPN1XPO1
SCHEMBL19056035 0.71 PTPN1 (0.35) PTPN1
SCHEMBL10064112 0.70 PTPN1 (0.31) PTPN1
SCHEMBL19245468 0.70 PTPN1 (0.36) PTPN1
SCHEMBL5898366 0.69 PTPN1 (0.40) PTPN1XPO1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9316909-B2 Patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2016-04-19 US disclosed
US-9316909-B2 Patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2016-04-19 US disclosed
US-20120009529-A1 PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2012-01-12 US disclosed
US-20120009529-A1 PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2012-01-12 US disclosed