Predicted protein targets (top 15)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.39 |
| ▸ | PTPN1 | P18031 | 1/20 | 0.36 |
| ▸ | HTT | P42858 | 2/20 | 0.34 |
| ▸ | GPX4 | P36969 | 1/20 | 0.33 |
| ▸ | KDM4E | B2RXH2 | 2/20 | 0.33 |
| ▸ | MAPT | P10636 | 2/20 | 0.33 |
| ▸ | NPC1 | O15118 | 1/20 | 0.33 |
| ▸ | POLB | P06746 | 1/20 | 0.33 |
| ▸ | PKM | P14618 | 1/20 | 0.33 |
| ▸ | RECQL | P46063 | 1/20 | 0.33 |
| ▸ | RAB9A | P51151 | 1/20 | 0.33 |
| ▸ | ATM | Q13315 | 1/20 | 0.33 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.33 |
| ▸ | XPO1 | O14980 | 1/20 | 0.32 |
| ▸ | LMNA | P02545 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL16691271 | 0.86 | PTPN1 (0.38) | ALDH1A1PTPN1HTTKDM4EMAPT | |
| SCHEMBL17247239 | 0.85 | ALDH1A1 (0.41) | ALDH1A1PTPN1 | |
| SCHEMBL1903579 | 0.83 | ALDH1A1 (0.37) | ALDH1A1GPX4ATM | |
| SCHEMBL328599 | 0.83 | CYP1A2 (0.35) | ALDH1A1HTTGPX4KDM4EMAPT | |
| SCHEMBL19681365 | 0.83 | GPX4 (0.31) | HTTGPX4KDM4EMAPTNPC1 | |
| SCHEMBL13496330 | 0.83 | PTPN1 (0.36) | PTPN1HTTKDM4EMAPTXPO1 | |
| SCHEMBL9880124 | 0.83 | ALDH1A1 (0.39) | ALDH1A1HTTGPX4KDM4EMAPT | |
| SCHEMBL27047575 | 0.83 | PTPN1 (0.36) | PTPN1HTTXPO1 | |
| SCHEMBL5307393 | 0.82 | PTPN1 (0.40) | PTPN1HTTKDM4EMAPTPOLB | |
| SCHEMBL4926758 | 0.82 | PTPN1 (0.40) | PTPN1HTTKDM4EMAPTPOLB |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 1598 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-119148465-A | Photosensitive resin composition, photosensitive dry film and application thereof | 杭州福斯特电子材料有限公司 | 2024-12-17 | — | — | CN | claimed |
| CN-118625599-A | Photosensitive resin composition, photosensitive dry film and preparation method thereof | 杭州福斯特电子材料有限公司 | 2024-09-10 | — | — | CN | claimed |
| US-9527938-B2 | Copolymer for lithography and method of manufacturing the same, resist composition, and method of manufacturing substrate | MITSUBISHI RAYON CO., LTD. (JP) | 2016-12-27 | — | — | US | claimed |
| US-9346775-B2 | Method for manufactruring β-(meth)acryloyloxy-γ-butyrolactones | JNC CORPORATION (JP) | 2016-05-24 | — | — | US | claimed |
| US-20150126753-A1 | METHOD FOR MANUFACTRURING BETA-(METH)ACRYLOYLOXY-GAMMA-BUTYROLACTONES | JNC CORPORATION (JP) | 2015-05-07 | — | — | US | claimed |
| US-20150099230-A1 | COPOLYMER FOR LITHOGRAPHY AND METHOD OF MANUFACTURING THE SAME, RESIST COMPOSITION, AND METHOD OF MANUFACTURING SUBSTRATE | MITSUBISHI RAYON CO., LTD. (JP) | 2015-04-09 | — | — | US | claimed |
| US-7834113-B2 | Photoresist compositions and processes for preparing the same | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 2010-11-16 | — | — | US | claimed |
| EP-1154321-B1 | Chemical amplification type positive resist compositions and sulfonium salts | SUMITOMO CHEMICAL CO (JP) | 2010-08-25 | — | — | EP | claimed |
| US-7592126-B2 | Positive resist composition and pattern forming method using the resist composition | FUJIFILM CORPORATION (JP) | 2009-09-22 | — | — | US | claimed |
| US-7579132-B2 | Salt suitable for an acid generator and a chemically amplified positive resist composition containing the same | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2009-08-25 | — | — | US | claimed |
| WO-2002084402-A2 | PROCESS FOR PRODUCING FILM FORMING RESINS FOR PHOTORESIST COMPOSITIONS | CLARIANT INTERNATIONAL LTD (CH) | 2002-10-24 | — | — | WO | claimed |
| US-20020081523-A1 | Chemical amplification type positive resist composition | SUMITOMO CHEMICAL CO., LTD. | 2002-06-27 | — | — | US | claimed |
| US-6406830-B2 | BIS(SULFONIUM METHYL)KETONE BISPERFLUOROALKANESULFONATE ACID GENERATOR WITH TRIPHENYLSULFONIUM OR DIPHENYLIODONIUM SALTS, AND A RESIN HAVING A UNIT UNSTABLE TO AN ACID, SUCH AS 2-ALKYL-2-ADAMANTYL (METH)ACRYLATE; RESOLUTION | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2002-06-18 | — | — | US | claimed |
| US-6348297-B1 | COMPOSITION COMPRISING ACID GENERATOR COMPRISING ALIPHATIC SULFONIUM SALT, TRIPHENYLSULFONIUM OR DIPHENYLIODONIUM SALT,RESIN HAVING ACID-LABILE GROUP WHICH IS INSOLUBLE IN ALKALI BUT BECOMES SOLUBLE BY ACTION OF ACID | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2002-02-19 | — | — | US | claimed |
| US-20020006582-A1 | Chemical amplification type positive resist compositions and sulfonium salts | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2002-01-17 | — | — | US | claimed |
| EP-1154321-A1 | Chemical amplification type positive resist compositions and sulfonium salts | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2001-11-14 | — | — | EP | claimed |
| US-6313321-B1 | Process for preparing β-hydroxy-γ-butyrolactones and β-(meth)acryloyloxy-γ-butrolactones | MITSUBISHI RAYON CO., LTD. (JP) | 2001-11-06 | — | — | US | claimed |
| US-20010016298-A1 | Chemically amplified positive resist composition | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2001-08-23 | — | — | US | claimed |
| EP-1122604-A2 | Chemically amplified positive resist composition | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2001-08-08 | — | — | EP | claimed |
| EP-1020767-A1 | Chemical amplification type positive resist composition | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2000-07-19 | — | — | EP | claimed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20150126753-A1 | METHOD FOR MANUFACTRURING BETA-(METH)ACRYLOYLOXY-GAMMA-BUTYROLACTONES | MCCC2, ACR, MMAB | ALDH1A1 414/4885PTPN1 4374/4885HTT 336/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.