SCHEMBL10065490

SCHEMBL10065490

C=CC(=O)OCCCN1C(=O)C(C)=C(C)C1=O

nearest known ligand 0.52

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
TSHR P16473 8/20 0.52
ALDH1A1 P00352 7/20 0.52
CYP3A4 P08684 1/20 0.52
HPGD P15428 1/20 0.51
PKM P14618 1/20 0.43
TP53 P04637 2/20 0.43
HIF1A Q16665 2/20 0.43
HSD17B10 Q99714 1/20 0.43
THRB P10828 2/20 0.37
ATM Q13315 1/20 0.34
MEN1 O00255 1/20 0.34
KMT2A Q03164 1/20 0.34
RXFP1 Q9HBX9 1/20 0.34
MAPK1 P28482 3/20 0.33
MAPT P10636 3/20 0.33
NPC1 O15118 1/20 0.33
LMNA P02545 1/20 0.33
NR2F2 P24468 1/20 0.33
HTT P42858 1/20 0.33
SMN1; SMN2 Q16637 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL17583279 0.95 TSHR (0.55) TSHRALDH1A1CYP3A4HPGDPKM
SCHEMBL8052057 0.94 TSHR (0.58) TSHRALDH1A1CYP3A4HPGDPKM
SCHEMBL7047458 0.90 TSHR (0.46) TSHRALDH1A1CYP3A4HPGDPKM
SCHEMBL10065496 0.84 TSHR (0.58) TSHRALDH1A1CYP3A4HPGDPKM
SCHEMBL10065495 0.84 TSHR (0.58) TSHRALDH1A1CYP3A4HPGDPKM
SCHEMBL4861737 0.80 TSHR (0.47) TSHRALDH1A1CYP3A4HPGDTP53
SCHEMBL9838180 0.80 MEN1 (0.56) TSHRALDH1A1CYP3A4HPGDHSD17B10
SCHEMBL15422957 0.79 TSHR (0.46) TSHRALDH1A1CYP3A4HPGDPKM
SCHEMBL15422951 0.79 TSHR (0.53) TSHRALDH1A1CYP3A4HPGDTP53
SCHEMBL15483460 0.79 TSHR (0.53) TSHRALDH1A1CYP3A4HPGDPKM

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 32 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0062610-B1 PHOTOPOLYMERISATION PROCESS CIBA-GEIGY AG (CH) 1985-04-24 EP claimed
US-4416975-A Photopolymerization process employing compounds containing acryloyl groups and maleimide groups CIBA-GEIGY CORPORATION (US) 1983-11-22 US claimed
EP-0062610-A2 Photopolymerisation process CIBA-GEIGY AG (CH) 1982-10-13 EP claimed
US-9284461-B2 Aqueous ink composition, inkjet recording method, and inkjet printed article FUJIFILM CORPORATION (JP) 2016-03-15 US disclosed
US-20150132544-A1 INK COMPOSITION, IMAGE FORMING METHOD, AND PRINTED MATERIAL FUJIFILM CORPORATION (JP) 2015-05-14 US disclosed
US-20150132544-A1 INK COMPOSITION, IMAGE FORMING METHOD, AND PRINTED MATERIAL FUJIFILM CORPORATION (JP) 2015-05-14 US disclosed
US-8905533-B2 Ink composition and image forming method FUJIFILM CORPORATION (JP) 2014-12-09 US disclosed
US-8905533-B2 Ink composition and image forming method FUJIFILM CORPORATION (JP) 2014-12-09 US disclosed
US-20140313268-A1 AQUEOUS INK COMPOSITION AND IMAGE FORMING METHOD FUJIFILM CORPORATION (JP) 2014-10-23 US disclosed
US-20140313268-A1 AQUEOUS INK COMPOSITION AND IMAGE FORMING METHOD FUJIFILM CORPORATION (JP) 2014-10-23 US disclosed
US-8852727-B2 Ink composition, image forming method, and printed matter FUJIFILM CORPORATION (JP) 2014-10-07 US disclosed
US-20120213978-A1 INK COMPOSITION, IMAGE FORMING METHOD, AND PRINTED MATERIAL FUJIFILM CORPORATION (JP) 2012-08-23 US disclosed
US-20120200653-A1 INK COMPOSITION AND IMAGE FORMING METHOD FUJIFILM CORPORATION (JP) 2012-08-09 US disclosed
US-20120052256-A1 AQUEOUS INK COMPOSITION, INKJET RECORDING METHOD, AND INKJET PRINTED ARTICLE FUJIFILM CORPORATION (JP) 2012-03-01 US disclosed
US-20120052256-A1 AQUEOUS INK COMPOSITION, INKJET RECORDING METHOD, AND INKJET PRINTED ARTICLE FUJIFILM CORPORATION (JP) 2012-03-01 US disclosed
EP-0062610-B1 PHOTOPOLYMERISATION PROCESS CIBA-GEIGY AG (CH) 1985-04-24 EP disclosed
US-4440850-A Photopolymerisation process with two exposures of a single layer CIBA-GEIGY CORPORATION (US) 1984-04-03 US disclosed
US-4416975-A Photopolymerization process employing compounds containing acryloyl groups and maleimide groups CIBA-GEIGY CORPORATION (US) 1983-11-22 US disclosed
EP-0071571-A1 Photopolymerisation process CIBA-GEIGY AG (CH) 1983-02-09 EP disclosed
EP-0062610-A2 Photopolymerisation process CIBA-GEIGY AG (CH) 1982-10-13 EP disclosed