SCHEMBL10069404

SCHEMBL10069404

CCCOC(=O)C(C)(CC(C)(C)C)C(C)(C)C

nearest known ligand 0.34

Predicted protein targets (top 11)

geneUniProtsupporting neighboursconfidence
HCAR2 Q8TDS4 1/20 0.34
ALDH1A1 P00352 3/20 0.33
RAB9A P51151 1/20 0.33
LMNA P02545 1/20 0.32
ESR1 P03372 1/20 0.32
CHRM1 P11229 1/20 0.32
TSHR P16473 1/20 0.32
SLC6A2 P23975 1/20 0.32
KDR P35968 1/20 0.32
TDP1 Q9NUW8 1/20 0.32
GRM1 Q13255 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL17129846 0.89 ALDH1A1 (0.33) ALDH1A1TSHR
SCHEMBL12191365 0.89 ALDH1A1 (0.45) HCAR2ALDH1A1LMNAESR1TSHR
SCHEMBL12192026 0.85 NAAA (0.47) HCAR2ALDH1A1LMNATSHR
SCHEMBL2880896 0.85 NAAA (0.47) HCAR2ALDH1A1LMNATSHR
SCHEMBL14409956 0.85 NAAA (0.47) HCAR2ALDH1A1LMNATSHR
SCHEMBL10069425 0.85 NAAA (0.47) HCAR2ALDH1A1LMNATSHR
SCHEMBL15672773 0.85 HCAR2 (0.32) HCAR2ALDH1A1LMNAESR1CHRM1
SCHEMBL16281212 0.85 HCAR2 (0.32) HCAR2ALDH1A1RAB9ALMNAESR1
SCHEMBL4404721 0.84 TSHR (0.33) TSHR
SCHEMBL31753 0.83 CYP4F2 (0.40) ALDH1A1LMNATSHR

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2023085293-A1 COMPOSITION FOR FORMING ACRYLAMIDE GROUP-CONTAINING RESIST UNDERLAYER FILM 日産化学株式会社 2023-05-19 WO disclosed
EP-2006738-B1 Lithographic printing plate precursor FUJIFILM CORP (JP) 2017-09-06 EP disclosed
US-9120288-B2 Pattern forming method, actinic ray-sensitive or radiation-sensitive resin composition, resist film, method for preparing electronic device, and electronic device FUJIFILM CORPORATION (JP) 2015-09-01 US disclosed
US-9086623-B2 Method of forming pattern, actinic-ray- or radiation-sensitive resin composition and actinic-ray- or radiation-sensitive film FUJIFILM CORPORATION (JP) 2015-07-21 US disclosed
EP-2423748-B1 Lithographic printing plate precursor and plate making method thereof FUJIFILM CORP (JP) 2013-05-22 EP disclosed
US-20130078432-A1 PATTERN FORMING METHOD, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, METHOD FOR PREPARING ELECTRONIC DEVICE, AND ELECTRONIC DEVICE FUJIFILM CORPORATION (JP) 2013-03-28 US disclosed
EP-2423748-A1 Lithographic printing plate precursor and plate making method thereof Fujifilm Corporation (JP) 2012-02-29 EP disclosed