Predicted protein targets (top 12)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | LMNA | P02545 | 1/20 | 0.35 |
| ▸ | POLB | P06746 | 1/20 | 0.35 |
| ▸ | HPGD | P15428 | 3/20 | 0.34 |
| ▸ | HTT | P42858 | 2/20 | 0.34 |
| ▸ | TSHR | P16473 | 1/20 | 0.34 |
| ▸ | NPSR1 | Q6W5P4 | 1/20 | 0.34 |
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.33 |
| ▸ | MEN1 | O00255 | 1/20 | 0.33 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.33 |
| ▸ | GAA | P10253 | 1/20 | 0.33 |
| ▸ | SLC6A3 | Q01959 | 2/20 | 0.32 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL11931641 | 0.94 | SLC6A3 (0.37) | LMNAPOLBHPGDHTTTSHR | |
| SCHEMBL14640917 | 0.94 | SLC6A3 (0.37) | LMNAPOLBHPGDHTTTSHR | |
| SCHEMBL10441223 | 0.85 | POLB (0.37) | LMNAPOLBHPGDHTTTSHR | |
| SCHEMBL18544524 | 0.83 | LMNA (0.36) | LMNAPOLBHPGDHTTTSHR | |
| SCHEMBL10799911 | 0.83 | SLC6A3 (0.37) | LMNAPOLBHPGDHTTTSHR | |
| SCHEMBL786034 | 0.82 | HTT (0.39) | LMNAPOLBHPGDHTTTSHR | |
| SCHEMBL10807859 | 0.81 | SLC6A3 (0.36) | LMNAPOLBHPGDHTTTSHR | |
| SCHEMBL10957531 | 0.81 | SLC6A3 (0.36) | HPGDTSHRNPSR1MEN1KMT2A | |
| SCHEMBL8762244 | 0.81 | — | — | |
| SCHEMBL13918183 | 0.80 | SLC6A3 (0.35) | HPGDTSHRNPSR1MEN1KMT2A |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20220066323-A1 | Laminate, composition, and laminate forming kit | FUJIFILM CORPORATION (JP) | 2022-03-03 | — | — | US | disclosed |
| US-9905768-B2 | Semiconductor device and insulating layer-forming composition | FUJIFILM CORPORATION (JP) | 2018-02-27 | — | — | US | disclosed |
| US-20170054076-A1 | SEMICONDUCTOR DEVICE AND INSULATING LAYER-FORMING COMPOSITION | FUJIFILM CORPORATION (JP) | 2017-02-23 | — | — | US | disclosed |
| US-8101341-B2 | Patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2012-01-24 | — | — | US | disclosed |
| US-8101341-B2 | Patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2012-01-24 | — | — | US | disclosed |
| US-20100178617-A1 | PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2010-07-15 | — | — | US | disclosed |
| US-20100178617-A1 | PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2010-07-15 | — | — | US | disclosed |