SCHEMBL10087743

SCHEMBL10087743

CCC(C)(C)C(=O)OC(C)(C1CCC(C(C)(C(F)(F)F)C(F)(F)F)CC1)C(F)(F)F

nearest known ligand 0.33

Predicted protein targets (top 1)

geneUniProtsupporting neighboursconfidence
LIPA P38571 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL14747374 0.88 LIPA (0.33) LIPA
SCHEMBL18198996 0.88 FKBP1A (0.34) LIPA
SCHEMBL2735512 0.87 LIPA (0.32) LIPA
SCHEMBL10115704 0.86 PDK1 (0.34) LIPA
SCHEMBL15113913 0.78 PDK1 (0.33)
SCHEMBL15116364 0.78 FKBP1A (0.35)
SCHEMBL16789535 0.78
SCHEMBL2741134 0.75 APOBEC3A (0.30)
SCHEMBL10115796 0.74 PDK1 (0.34) LIPA
SCHEMBL11941655 0.73 HMGCR (0.33)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8343708-B2 Positive resist composition and pattern forming method FUJIFILM CORPORATION (JP) 2013-01-01 US disclosed
US-20120034564-A1 POSITIVE RESIST COMPOSITION AND PATTERN FORMING METHOD FUJIFILM CORPORATION (JP) 2012-02-09 US disclosed