SCHEMBL10104727

SCHEMBL10104727

CCN(CC)c1ccc(/C=C2/O/C(=N\C3CCCCC3)N(C3CCCCC3)C2=O)cc1

nearest known ligand 0.54

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
NOX4 Q9NPH5 7/20 0.54
CYBB P04839 6/20 0.54
ALDH1A1 P00352 7/20 0.41
MEN1 O00255 4/20 0.41
KMT2A Q03164 4/20 0.41
LMNA P02545 1/20 0.41
RECQL P46063 1/20 0.41
NOX1 Q9Y5S8 1/20 0.40
FAAH O00519 1/20 0.40
MAPT P10636 4/20 0.39
HPGD P15428 3/20 0.39
KDM4E B2RXH2 1/20 0.39
CYP1A2 P05177 1/20 0.39
CYP2C19 P33261 1/20 0.39
L3MBTL1 Q9Y468 1/20 0.39
NPSR1 Q6W5P4 1/20 0.39
MAOB P27338 2/20 0.38
MAOA P21397 1/20 0.38
CRHBP P24387 1/20 0.37
CRHR2 Q13324 1/20 0.37

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL4544728 1.00 NOX4 (0.54) NOX4CYBBALDH1A1MEN1KMT2A
SCHEMBL1104331 1.00 NOX4 (0.54) NOX4CYBBALDH1A1MEN1KMT2A
SCHEMBL12441986 0.99 NOX4 (0.53) NOX4CYBBALDH1A1MEN1KMT2A
SCHEMBL1104372 0.99 NOX4 (0.53) NOX4CYBBALDH1A1MEN1KMT2A
SCHEMBL12017048 0.90 NOX4 (0.56) NOX4CYBBALDH1A1MEN1KMT2A
SCHEMBL1104352 0.87 CYBB (0.45) NOX4CYBBALDH1A1MEN1KMT2A
SCHEMBL12441978 0.87 CYBB (0.45) NOX4CYBBALDH1A1MEN1KMT2A
SCHEMBL12442006 0.87 FAAH (0.45) NOX4CYBBALDH1A1MEN1KMT2A
SCHEMBL1104391 0.87 FAAH (0.45) NOX4CYBBALDH1A1MEN1KMT2A
SCHEMBL10313264 0.87 FAAH (0.45) NOX4CYBBALDH1A1MEN1KMT2A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 97 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-2725422-B1 PHOTOSENSITIVE COMPOSITION, MASTER PLATE FOR PLANOGRAPHIC PRINTING PLATE AND POLYURETHANE FUJIFILM CORP (JP) 2017-10-04 EP disclosed
EP-1939687-B1 Polymerizable composition and lithographic printing plate precursor FUJIFILM CORP (JP) 2016-09-14 EP disclosed
EP-2360529-B1 METHOD FOR MANUFACTURING LITHOGRAPHIC PRINTING PLATE, DEVELOPER FOR ORIGINAL LITHOGRAPHIC PRINTING PLATE, AND REPLENISHER FOR DEVELOPING ORIGINAL LITHOGRAPHIC PRINTING PLATE FUJIFILM CORP (JP) 2016-08-24 EP disclosed
US-8927195-B2 Photosensitive composition, planographic printing plate precursor, polyurethane, and method for producing polyurethane FUJIFILM CORPORATION (JP) 2015-01-06 US disclosed
US-8927195-B2 Photosensitive composition, planographic printing plate precursor, polyurethane, and method for producing polyurethane FUJIFILM CORPORATION (JP) 2015-01-06 US disclosed
US-8908293-B2 Dispersion composition, photosensitive resin composition, and solid-state image pick-up element FUJIFILM CORPORATION (JP) 2014-12-09 US disclosed
US-8908293-B2 Dispersion composition, photosensitive resin composition, and solid-state image pick-up element FUJIFILM CORPORATION (JP) 2014-12-09 US disclosed
EP-2141206-B1 Novel compound, polymerizable composition, color filter and production method thereof, solid-state imaging device, and planographic printing plate precursor FUJIFILM CORP (JP) 2014-12-03 EP disclosed
US-8846277-B2 Compound, polymerizable composition, color filter, and method of producing the same, solid-state imaging device, and planographic printing plate precursor FUJIFILM CORPORATION (JP) 2014-09-30 US disclosed
US-8846277-B2 Compound, polymerizable composition, color filter, and method of producing the same, solid-state imaging device, and planographic printing plate precursor FUJIFILM CORPORATION (JP) 2014-09-30 US disclosed
US-20070231745-A1 Method for preparation of lithographic printing plate and lithographic printing plate precursor FUJIFILM CORPORATION (JP) 2007-10-04 US disclosed
US-20070207411-A1 Method for preparation of lithographic printing plate and lithographic printing plate precursor FUJIFILM CORPORATION (JP) 2007-09-06 US disclosed
US-20070207411-A1 Method for preparation of lithographic printing plate and lithographic printing plate precursor FUJIFILM CORPORATION (JP) 2007-09-06 US disclosed
EP-1829681-A2 Method for preparation of lithographic printing plate and lithographic printing plate precursor FUJIFILM Corporation (JP) 2007-09-05 EP disclosed
EP-1762894-A1 Photopolymerizable photosensitive lithographic printing plate FUJIFILM Corporation (JP) 2007-03-14 EP disclosed
US-20070048663-A1 Photopolymerizable photosensitive lithographic printing plate FUJI PHOTO FILM CO., LTD. 2007-03-01 US disclosed
US-20070048663-A1 Photopolymerizable photosensitive lithographic printing plate FUJI PHOTO FILM CO., LTD. 2007-03-01 US disclosed
EP-1752308-A1 Lithographic printing plate support, method of manufacturing the same, and presensitized plate Fuji Photo Film Co., Ltd. (JP) 2007-02-14 EP disclosed
US-20070012573-A1 Lithographic printing plate support, method of manufacturing the same, and presensitized plate FUJI PHOTO FILM CO., LTD. 2007-01-18 US disclosed
US-20070012573-A1 Lithographic printing plate support, method of manufacturing the same, and presensitized plate FUJI PHOTO FILM CO., LTD. 2007-01-18 US disclosed