Predicted protein targets (top 5)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | JAK2 | O60674 | 1/20 | 0.31 |
| ▸ | JAK1 | P23458 | 1/20 | 0.31 |
| ▸ | TYK2 | P29597 | 1/20 | 0.31 |
| ▸ | JAK3 | P52333 | 1/20 | 0.31 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL17252249 | 1.00 | JAK2 (0.31) | JAK2JAK1TYK2JAK3TDP1 | |
| SCHEMBL17253449 | 1.00 | JAK2 (0.31) | JAK2JAK1TYK2JAK3TDP1 | |
| SCHEMBL131878 | 1.00 | — | — | |
| SCHEMBL5552795 | 0.97 | — | — | |
| SCHEMBL9647351 | 0.91 | RIPK1 (0.31) | — | |
| SCHEMBL9647335 | 0.91 | RIPK1 (0.31) | — | |
| SCHEMBL19335820 | 0.91 | — | — | |
| SCHEMBL9647344 | 0.91 | RIPK1 (0.31) | — | |
| SCHEMBL29235791 | 0.91 | — | — | |
| SCHEMBL8614566 | 0.91 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 118 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-2726450-B1 | ETHERS OF BIS(HYDROXYMETHYL)CYCLOHEXANES | BASF SE (DE) | 2017-12-06 | — | — | EP | claimed |
| US-9452962-B2 | Ethers of bis(hydroxymethyl)cyclohexanes | BASF SE (DE) | 2016-09-27 | — | — | US | claimed |
| US-20140296579-A1 | ETHERS OF BIS (HYDROXYMETHYL) CYCLOHEXANES | BASF SE (DE) | 2014-10-02 | — | — | US | claimed |
| US-20240329525-A1 | PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR MANUFACTURING CURED RELIEF PATTERN, AND SEMICONDUCTOR APPARATUS | ASAHI KASEI KABUSHIKI KAISHA (JP) | 2024-10-03 | — | — | US | disclosed |
| US-12034115-B2 | Solid electrolyte composition, sheet for all-solid state secondary battery, electrode sheet for all-solid state secondary battery, and all-solid state secondary battery | FUJIFILM CORPORATION (JP) | 2024-07-09 | — | — | US | disclosed |
| US-20240210827-A1 | PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR MANUFACTURING CURED RELIEF PATTERN, AND SEMICONDUCTOR APPARATUS | ASAHI KASEI KABUSHIKI KAISHA (JP) | 2024-06-27 | — | — | US | disclosed |
| US-20240213479-A1 | ELECTRODE COMPOSITION, ELECTRODE SHEET FOR ALL-SOLID STATE SECONDARY BATTERY, ALL-SOLID STATE SECONDARY BATTERY, AND MANUFACTURING METHODS FOR ELECTRODE COMPOSITION, ELECTRODE SHEET FOR ALL-SOLID STATE SECONDARY BATTERY, AND ALL-SOLID STATE SECONDARY BATTERY | FUJIFILM CORPORATION (JP) | 2024-06-27 | — | — | US | disclosed |
| US-11873370-B2 | Polycarbonate resin composition, molded article, and multilayer body | MITSUBISHI CHEMICAL CORPORATION (JP) | 2024-01-16 | — | — | US | disclosed |
| US-11873370-B2 | Polycarbonate resin composition, molded article, and multilayer body | MITSUBISHI CHEMICAL CORPORATION (JP) | 2024-01-16 | — | — | US | disclosed |
| US-20230400770-A1 | Resist Underlayer Film Material, Patterning Process, And Method For Forming Resist Underlayer Film | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-12-14 | — | — | US | disclosed |
| US-11807023-B2 | Pretreatment liquid, ink set, image recorded material, base material for image recording, method of producing base material for image recording, and image recording method | FUJIFILM CORPORATION (JP) | 2023-11-07 | — | — | US | disclosed |
| WO-2008076281-A1 | REINFORCED PCT COMPOSITIONS | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 2008-06-26 | — | — | WO | disclosed |
| US-20080153954-A1 | Reinforced PCT compositions | TICONA LLC | 2008-06-26 | — | — | US | disclosed |
| US-20080153954-A1 | Reinforced PCT compositions | TICONA LLC | 2008-06-26 | — | — | US | disclosed |
| US-20080146759-A1 | Sulfur-Containing Compound, Method for Producing Same, Sulfur-Containing Polymer, and Optical Material | IDEMITSU KOSAN CO., LTD (JP) | 2008-06-19 | — | — | US | disclosed |
| US-20080070154-A1 | DECOMPOSABLE RESIN COMPOSITION AND PATTERN-FORMING MATERIAL INCLUDING THE SAME | FUJIFILM CORPORATION (JP) | 2008-03-20 | — | — | US | disclosed |
| US-20070213458-A1 | Light-emitting diode assembly housing comprising poly(cyclohexanedimethanol terephthalate) compositions | TICONA LLC | 2007-09-13 | — | — | US | disclosed |
| US-20070213458-A1 | Light-emitting diode assembly housing comprising poly(cyclohexanedimethanol terephthalate) compositions | TICONA LLC | 2007-09-13 | — | — | US | disclosed |
| WO-2007033129-A2 | LIGHT-EMITTING DIODE ASSEMBLY HOUSING COMPRISING POLY(CYCLOHEXANEDIMETHANOL TEREPHTHALATE) COMPOSITIONS | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 2007-03-22 | — | — | WO | disclosed |
| US-7189299-B2 | Thermal-dye-transfer label capable of reproducing flesh tones | EASTMAN KODAK COMPANY (US) | 2007-03-13 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20140296579-A1 | ETHERS OF BIS (HYDROXYMETHYL) CYCLOHEXANES | CYP2E1, CYP1A1, CYP2S1 | JAK2 4670/4885JAK1 4835/4885TYK2 4638/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.