SCHEMBL10112769

SCHEMBL10112769

Cc1ccc(C)c(C(=O)c2ccc(Oc3ccc4cc(S(=O)(=O)O)cc(S(=O)(=O)O)c4c3)cc2)c1

nearest known ligand 0.38

Predicted protein targets (top 16)

geneUniProtsupporting neighboursconfidence
ENPP2 Q13822 3/20 0.38
MAPT P10636 3/20 0.36
TP53 P04637 2/20 0.36
SMN1; SMN2 Q16637 2/20 0.36
SRD5A2 P31213 1/20 0.35
PTGES O14684 1/20 0.35
CYP2C9 P11712 1/20 0.35
CYP2C19 P33261 1/20 0.35
MMP13 P45452 1/20 0.35
HTT P42858 2/20 0.35
SNCA P37840 1/20 0.35
TDP1 Q9NUW8 1/20 0.35
L3MBTL1 Q9Y468 1/20 0.35
GFER P55789 1/20 0.34
ALDH1A1 P00352 2/20 0.34
HIF1A Q16665 1/20 0.34

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL13671429 0.84 MMP13 (0.43) MAPTTP53SMN1; SMN2SRD5A2CYP2C9
SCHEMBL10112773 0.82 SNCA (0.39) ENPP2MAPTTP53SMN1; SMN2CYP2C9
SCHEMBL17207942 0.79 L3MBTL1 (0.50) MAPTTP53SMN1; SMN2SRD5A2CYP2C9
SCHEMBL13353947 0.79 MAPT (0.39) ENPP2MAPTTP53SRD5A2ALDH1A1
SCHEMBL17207941 0.78 HTT (0.54) MAPTTP53SMN1; SMN2SRD5A2MMP13
SCHEMBL17207932 0.78 HTT (0.54) MAPTTP53SMN1; SMN2SRD5A2MMP13
SCHEMBL17207943 0.77 MMP13 (0.51) MAPTSMN1; SMN2SRD5A2MMP13HTT
SCHEMBL17207928 0.77 MMP13 (0.51) MAPTSMN1; SMN2SRD5A2MMP13HTT
SCHEMBL15290154 0.77 MMP13 (0.56) MAPTSMN1; SMN2SRD5A2MMP13HTT
SCHEMBL10084206 0.77 F2 (0.33) ENPP2CYP2C9MMP13ALDH1A1HIF1A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 13 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9764276-B2 Resin composition and carbon dioxide gas separation membrane SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2017-09-19 US disclosed
US-9764276-B2 Resin composition and carbon dioxide gas separation membrane SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2017-09-19 US disclosed
US-20160158692-A1 RESIN COMPOSITION AND CARBON DIOXIDE GAS SEPARATION MEMBRANE SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2016-06-09 US disclosed
US-20160158692-A1 RESIN COMPOSITION AND CARBON DIOXIDE GAS SEPARATION MEMBRANE SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2016-06-09 US disclosed
US-20140154610-A1 AROMATIC COPOLYMER HAVING PROTON CONDUCTIVE GROUP AND USES THEREOF JSR CORPORATION (JP) 2014-06-05 US disclosed
US-20140154610-A1 AROMATIC COPOLYMER HAVING PROTON CONDUCTIVE GROUP AND USES THEREOF JSR CORPORATION (JP) 2014-06-05 US disclosed
US-8729219-B2 Polyarylene block copolymer having sulfonic acid group and use thereof JSR CORPORATION (JP) 2014-05-20 US disclosed
US-8729219-B2 Polyarylene block copolymer having sulfonic acid group and use thereof JSR CORPORATION (JP) 2014-05-20 US disclosed
US-20130085236-A1 POLYARYLENE BLOCK COPOLYMER HAVING SULFONIC ACID GROUP AND USE THEREOF JSR CORPORATION (JP) 2013-04-04 US disclosed
US-20130085236-A1 POLYARYLENE BLOCK COPOLYMER HAVING SULFONIC ACID GROUP AND USE THEREOF JSR CORPORATION (JP) 2013-04-04 US disclosed
US-20120052412-A1 POLYARYLENE BLOCK COPOLYMER HAVING SULFONIC ACID GROUP AND USE THEREOF HONDA MOTOR CO., LTD. (JP) 2012-03-01 US disclosed
US-20120052412-A1 POLYARYLENE BLOCK COPOLYMER HAVING SULFONIC ACID GROUP AND USE THEREOF HONDA MOTOR CO., LTD. (JP) 2012-03-01 US disclosed
EP-2424018-A1 Polyarylene block copolymer having sulfonic acid group and use thereof JSR Corporation (JP) 2012-02-29 EP disclosed