SCHEMBL10112772

SCHEMBL10112772

Cc1ccc(C)c(C(=O)c2ccc(Oc3ccc(C(=O)c4cccc(S(=O)(=O)O)c4)cc3S(=O)(=O)O)c(S(=O)(=O)O)c2)c1

nearest known ligand 0.43

Predicted protein targets (top 14)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 2/20 0.39
LMNA P02545 2/20 0.39
MAPT P10636 1/20 0.39
KMT2A Q03164 1/20 0.39
L3MBTL1 Q9Y468 1/20 0.37
CYP1A2 P05177 1/20 0.36
HPGD P15428 1/20 0.36
HSD17B10 Q99714 1/20 0.36
TSHR P16473 1/20 0.36
HTT P42858 1/20 0.36
SMN1; SMN2 Q16637 1/20 0.36
SRC P12931 2/20 0.35
TGFBR1 P36897 2/20 0.35
POLB P06746 1/20 0.34

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL10112764 0.86 POLB (0.44) ALDH1A1LMNAL3MBTL1CYP1A2HPGD
SCHEMBL10112774 0.84 SMN1; SMN2 (0.40) ALDH1A1LMNAMAPTKMT2ACYP1A2
SCHEMBL14395635 0.80 SMN1; SMN2 (0.47) ALDH1A1LMNAMAPTKMT2AL3MBTL1
SCHEMBL10112776 0.77 ALDH1A1 (0.40) ALDH1A1LMNAMAPTKMT2ACYP1A2
SCHEMBL778632 0.76 POLB (0.51) ALDH1A1MAPTKMT2ACYP1A2HPGD
SCHEMBL12242044 0.75 MAPT (0.43) ALDH1A1LMNAMAPTKMT2ACYP1A2
SCHEMBL12280269 0.75 STS (0.40) ALDH1A1MAPTKMT2ATSHRHTT
SCHEMBL10112773 0.74 SNCA (0.39) ALDH1A1LMNAMAPTKMT2ACYP1A2
SCHEMBL12242045 0.74 MAPT (0.43) ALDH1A1LMNAMAPTKMT2ACYP1A2
SCHEMBL12280684 0.74 MAPT (0.43) ALDH1A1LMNAMAPTKMT2ACYP1A2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 12 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9764276-B2 Resin composition and carbon dioxide gas separation membrane SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2017-09-19 US disclosed
US-9764276-B2 Resin composition and carbon dioxide gas separation membrane SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2017-09-19 US disclosed
US-20160158692-A1 RESIN COMPOSITION AND CARBON DIOXIDE GAS SEPARATION MEMBRANE SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2016-06-09 US disclosed
US-20160158692-A1 RESIN COMPOSITION AND CARBON DIOXIDE GAS SEPARATION MEMBRANE SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2016-06-09 US disclosed
US-20140154610-A1 AROMATIC COPOLYMER HAVING PROTON CONDUCTIVE GROUP AND USES THEREOF JSR CORPORATION (JP) 2014-06-05 US disclosed
US-20140154610-A1 AROMATIC COPOLYMER HAVING PROTON CONDUCTIVE GROUP AND USES THEREOF JSR CORPORATION (JP) 2014-06-05 US disclosed
US-8729219-B2 Polyarylene block copolymer having sulfonic acid group and use thereof JSR CORPORATION (JP) 2014-05-20 US disclosed
US-8729219-B2 Polyarylene block copolymer having sulfonic acid group and use thereof JSR CORPORATION (JP) 2014-05-20 US disclosed
US-20130085236-A1 POLYARYLENE BLOCK COPOLYMER HAVING SULFONIC ACID GROUP AND USE THEREOF JSR CORPORATION (JP) 2013-04-04 US disclosed
US-20130085236-A1 POLYARYLENE BLOCK COPOLYMER HAVING SULFONIC ACID GROUP AND USE THEREOF JSR CORPORATION (JP) 2013-04-04 US disclosed
US-20120052412-A1 POLYARYLENE BLOCK COPOLYMER HAVING SULFONIC ACID GROUP AND USE THEREOF HONDA MOTOR CO., LTD. (JP) 2012-03-01 US disclosed
US-20120052412-A1 POLYARYLENE BLOCK COPOLYMER HAVING SULFONIC ACID GROUP AND USE THEREOF HONDA MOTOR CO., LTD. (JP) 2012-03-01 US disclosed