Predicted protein targets (top 18)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | PRKCE | Q02156 | 3/20 | 0.40 |
| ▸ | MYLK | Q15746 | 2/20 | 0.40 |
| ▸ | MEN1 | O00255 | 2/20 | 0.40 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.40 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.40 |
| ▸ | PRKCG | P05129 | 1/20 | 0.40 |
| ▸ | MAPT | P10636 | 1/20 | 0.40 |
| ▸ | PRKCA | P17252 | 1/20 | 0.40 |
| ▸ | APEX1 | P27695 | 1/20 | 0.40 |
| ▸ | RECQL | P46063 | 1/20 | 0.40 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.40 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.35 |
| ▸ | ALOX15 | P16050 | 1/20 | 0.35 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.35 |
| ▸ | HTT | P42858 | 1/20 | 0.35 |
| ▸ | KLF10 | Q13118 | 1/20 | 0.32 |
| ▸ | ALOX5 | P09917 | 4/20 | 0.31 |
| ▸ | PTGS2 | P35354 | 3/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL18184901 | 1.00 | PRKCE (0.40) | PRKCEMYLKMEN1KMT2AALDH1A1 | |
| SCHEMBL12151245 | 1.00 | PRKCE (0.40) | PRKCEMYLKMEN1KMT2AALDH1A1 | |
| SCHEMBL14997929 | 0.94 | PRKCE (0.36) | PRKCEMYLKMEN1KMT2AALDH1A1 | |
| SCHEMBL15944073 | 0.90 | ALOX15 (0.39) | PRKCEMYLKMEN1KMT2AALDH1A1 | |
| SCHEMBL15745417 | 0.90 | ALOX15 (0.39) | PRKCEMYLKMEN1KMT2AALDH1A1 | |
| SCHEMBL12151244 | 0.90 | ALOX15 (0.39) | PRKCEMYLKMEN1KMT2AALDH1A1 | |
| SCHEMBL19484771 | 0.90 | ALOX15 (0.39) | PRKCEMYLKMEN1KMT2AALDH1A1 | |
| SCHEMBL12937588 | 0.90 | ALOX15 (0.39) | PRKCEMYLKMEN1KMT2AALDH1A1 | |
| SCHEMBL10051862 | 0.90 | ALOX15 (0.46) | PRKCEMYLKMEN1KMT2AALDH1A1 | |
| SCHEMBL16850512 | 0.90 | ALOX15 (0.46) | PRKCEMYLKMEN1KMT2AALDH1A1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 43 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20230369271-A1 | DISPLAY DEVICE AND METHOD FOR MANUFACTURING DISPLAY DEVICE | TORAY INDUSTRIES, INC. (JP) | 2023-11-16 | — | — | US | disclosed |
| US-20230350305-A1 | MANUFACTURING METHOD FOR CURED SUBSTANCE, MANUFACTURING METHOD FOR LAMINATE, AND MANUFACTURING METHOD FOR SEMICONDUCTOR DEVICE, AND TREATMENT LIQUID | FUJIFILM CORPORATION (JP) | 2023-11-02 | — | — | US | disclosed |
| US-20230335697-A1 | DISPLAY DEVICE AND PRODUCTION METHOD FOR DISPLAY DEVICE | TORAY INDUSTRIES, INC. (JP) | 2023-10-19 | — | — | US | disclosed |
| US-20230324802-A1 | RESIST UNDERLAYER FILM-FORMING COMPOSITION CONTAINING INDOLOCARBAZOLE NOVOLAK RESIN | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2023-10-12 | — | — | US | disclosed |
| US-11640110-B2 | Resin composition, method for producing heat-resistant resin film, and display device | TORAY INDUSTRIES, INC. (JP) | 2023-05-02 | — | — | US | disclosed |
| US-20230125270-A1 | RADIATION SENSITIVE COMPOSITION | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2023-04-27 | — | — | US | disclosed |
| US-20180181000-A1 | RADIATION SENSITIVE COMPOSITION | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2018-06-28 | — | — | US | disclosed |
| US-20180051136-A1 | PHOTOSENSITIVE RESIN COMPOSITION AND ELECTRONIC COMPONENT | TORAY INDUSTRIES, INC. (JP) | 2018-02-22 | — | — | US | disclosed |
| US-20180052391-A1 | PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE RESIN COMPOSITION FILM, CURED PRODUCT, INSULATING FILM AND MULTILAYER WIRING BOARD | TORAY INDUSTRIES, INC. (JP) | 2018-02-22 | — | — | US | disclosed |
| US-20180039174-A1 | PHOTOSENSITIVE RESIN COMPOSITION | TORAY INDUSTRIES, INC. (JP) | 2018-02-08 | — | — | US | disclosed |
| US-20140235059-A1 | DIARYLAMINE NOVOLAC RESIN | NISSAN CHEMICAL INDUSTRIES, LTD (JP) | 2014-08-21 | — | — | US | disclosed |
| US-20140235060-A1 | RESIST UNDERLAYER FILM-FORMING COMPOSITION WHICH CONTAINS ALICYCLIC SKELETON-CONTAINING CARBAZOLE RESIN | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2014-08-21 | — | — | US | disclosed |
| US-8722841-B2 | Carbazole novolak resin | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2014-05-13 | — | — | US | disclosed |
| US-8674052-B2 | Carbazole novolak resin | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2014-03-18 | — | — | US | disclosed |
| US-20140014928-A1 | ORGANIC EL ELEMENT, RADIATION-SENSITIVE RESIN COMPOSITION, AND CURED FILM | JSR CORPORATION (JP) | 2014-01-16 | — | — | US | disclosed |
| US-20130280913-A1 | COMPOSITION FOR FORMING A RESIST UNDERLAYER FILM INCLUDING HYDROXYL GROUP-CONTAINING CARBAZOLE NOVOLAC RESIN | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2013-10-24 | — | — | US | disclosed |
| US-20130189533-A1 | RESIST UNDERLAYER FILM FORMING COMPOSITION FOR LITHOGRAPHY CONTAINING POLYETHER STRUCTURE-CONTAINING RESIN | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2013-07-25 | — | — | US | disclosed |
| US-20130122710-A1 | CARBAZOLE NOVOLAK RESIN | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2013-05-16 | — | — | US | disclosed |
| US-20120251949-A1 | POSITIVE TYPE PHOTOSENSITIVE RESIN COMPOSITION | TORAY INDUSTRIES, INC. (JP) | 2012-10-04 | — | — | US | disclosed |
| US-20120077345-A1 | CARBAZOLE NOVOLAK RESIN | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2012-03-29 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20180181000-A1 | RADIATION SENSITIVE COMPOSITION | RER1, RAD1, RAD51 | PRKCE 3408/4885MYLK 3497/4885MEN1 2314/4885 |
| US-20230125270-A1 | RADIATION SENSITIVE COMPOSITION | XRCC6, RAD50, XRCC5 | PRKCE 2659/4885MYLK 3465/4885MEN1 194/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.