SCHEMBL1012485

SCHEMBL1012485

CC(N)CCCCC(C)N

nearest known ligand 0.75

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
OPRM1 P35372 1/20 0.75
TP53 P04637 1/20 0.55
ALDH1A1 P00352 4/20 0.50
TDP1 Q9NUW8 1/20 0.50
TRPV1 Q8NER1 1/20 0.45
TRPA1 O75762 1/20 0.45
GABRP O00591 2/20 0.43
GABRD O14764 2/20 0.43
GABRA1 P14867 2/20 0.43
GABRB1 P18505 2/20 0.43
GABRG2 P18507 2/20 0.43
GABRB3 P28472 2/20 0.43
GABRA5 P31644 2/20 0.43
GABRA3 P34903 2/20 0.43
GABRA2 P47869 2/20 0.43
GABRB2 P47870 2/20 0.43
GABRA4 P48169 2/20 0.43
GABRE P78334 2/20 0.43
GABRA6 Q16445 2/20 0.43
GABRG1 Q8N1C3 2/20 0.43

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL49007 0.96 OPRM1 (0.71) OPRM1TP53ALDH1A1TDP1TRPV1
SCHEMBL10922365 0.96 OPRM1 (0.71) OPRM1TP53ALDH1A1TDP1TRPV1
SCHEMBL8892979 0.96 OPRM1 (0.71) OPRM1TP53ALDH1A1TDP1TRPV1
SCHEMBL8892964 0.96 OPRM1 (0.71) OPRM1TP53ALDH1A1TDP1TRPV1
SCHEMBL7734724 0.96 OPRM1 (0.71) OPRM1TP53ALDH1A1TDP1TRPV1
SCHEMBL317886 0.92
SCHEMBL14654820 0.92
SCHEMBL11229772 0.89 OPRM1 (0.63) OPRM1TP53ALDH1A1TDP1TRPV1
SCHEMBL21206243 0.89 OPRM1 (0.63) OPRM1TP53ALDH1A1TDP1TRPV1
SCHEMBL9193799 0.89 OPRM1 (0.63) OPRM1TP53ALDH1A1TDP1TRPV1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 64 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-105440282-B 1,3,5 triazine derivative compounds and preparation method of the high or low degree of polymerization 苏州至善化学有限公司 2018-01-16 CN claimed
CN-105440282-A 1,3,5-triazine derivative compounds with high or low polymerization degree and preparation methods SUZHOU TOKIND CHEMICAL CO LTD 2016-03-30 CN claimed
CN-103108918-B Method for manufacturing resin for thiourethane-based optical material using universal polyisocyanate compound, resin composition, and optical material manufactured thereby KOC SOLUTION CO LTD 2015-07-15 CN claimed
CN-103108918-A Method for manufacturing resin for thiourethane-based optical material using universal polyisocyanate compound, resin composition, and optical material manufactured thereby KOC SOLUTION CO LTD 2013-05-15 CN claimed
EP-2271692-A2 COMPOSITION AND METHOD FOR CORROSION PROTECTION OF A STRUCTURE The Boeing Company (US) 2011-01-12 EP claimed
WO-2009129206-A2 COMPOSITION AND METHOD FOR CORROSION PROTECTION OF A STRUCTURE THE BOEING COMPANY (US) 2009-10-22 WO claimed
US-4001213-A SOLID METAL CATALYST; AMMONIA-FREE MONSANTO COMPANY (US) 1977-01-04 US claimed
CN-122013590-A Polymer waterproof antibacterial coating packing box corrugated paper and preparation method thereof 浙江巨鼎包装有限公司 2026-05-12 CN disclosed
WO-2024150597-A1 THERMOSETTING RESIN COMPOSITION, CURED FILM, SUBSTRATE, AND ELECTRONIC COMPONENT JNC株式会社 2024-07-18 WO disclosed
WO-2024150578-A1 HEAT-CURABLE RESIN COMPOSITION, CURED PRODUCT, AND ELECTRONIC COMPONENT JNC株式会社 2024-07-18 WO disclosed
WO-2024139080-A1 CHEMICAL MECHANICAL POLISHING COMPOSITION USED FOR EDGE POLISHING 昂士特科技(深圳)有限公司 2024-07-04 WO disclosed
CN-116254059-B Chemical mechanical polishing composition for edge polishing 昂士特科技(深圳)有限公司 2024-01-23 CN disclosed
CN-117136335-A Photosensitive resin composition 味之素株式会社 2023-11-28 CN disclosed
EP-0379377-A2 Process for preparing photosensitive heat-resistant polymer Chisso Corporation (JP) 1990-07-25 EP disclosed
US-4709032-A VASODILATION AND HYPOTENSIVE AGENT ASAHI KASEI KOGYO KABUSHIKI KAISHA (JP) 1987-11-24 US disclosed
US-4634770-A VASODILATORS, HYPOTENSIVES ASAHI KASEI KOGYO KABUSHIKI KAISHA (JP) 1987-01-06 US disclosed
EP-0001797-B1 PROCESS FOR THE ISOLATION OF CEPHALOSPORIN C, ITS SALTS AND ITS DERIVATIVES, FROM CULTURE MEDIA AND SOLUTIONS HOECHST AKTIENGESELLSCHAFT (DE) 1981-06-17 EP disclosed
US-4204058-A Process for obtaining cephalosporin C and the salts and derivatives thereof from culture filtrates or culture solutions HOECHST AKTIENGESELLSCHAFT (DE) 1980-05-20 US disclosed
EP-0001797-A1 Process for the isolation of cephalosporin C, its salts and its derivatives, from culture media and solutions HOECHST AKTIENGESELLSCHAFT (DE) 1979-05-16 EP disclosed
US-4001213-A SOLID METAL CATALYST; AMMONIA-FREE MONSANTO COMPANY (US) 1977-01-04 US disclosed