SCHEMBL10127906

SCHEMBL10127906

CN(S(=O)(=O)C(F)(F)C(F)(F)F)S(=O)(=O)C(F)(F)C(F)(F)F

nearest known ligand 0.33

Predicted protein targets (top 4)

geneUniProtsupporting neighboursconfidence
CA1 P00915 1/20 0.33
CA2 P00918 1/20 0.33
CA7 P43166 1/20 0.33
CA13 Q8N1Q1 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL13589016 0.83 CA2 (0.36) CA1CA2
SCHEMBL2058155 0.82 CA1 (0.33) CA1CA2CA7CA13
SCHEMBL4754969 0.81 CA1 (0.37) CA1CA2CA7CA13
SCHEMBL24358891 0.81 CA2 (0.44) CA1CA2
SCHEMBL30444372 0.78 CA1 (0.30) CA1CA2CA7CA13
SCHEMBL31686017 0.75 CA2 (0.37) CA1CA2CA7CA13
SCHEMBL12667579 0.73
SCHEMBL5023281 0.73 CA1 (0.35) CA1CA2CA7CA13
SCHEMBL5872424 0.72 CA1 (0.30) CA1CA2
SCHEMBL13817649 0.71

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 8 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2023140429-A1 ELECTROLYTE FOR RECHARGEABLE LITHIUM BATTERY AND RECHARGEABLE LITHIUM BATTERY INCLUDING SAME 삼성에스디아이 주식회사 2023-07-27 WO disclosed
US-20210257669-A1 POWER STORAGE DEVICE AND ELECTRONIC DEVICE SEMICONDUCTOR ENERGY LAB (JP) 2021-08-19 US disclosed
EP-2003148-B1 RADIATION-SENSITIVE RESIN COMPOSITION COMPRISING A FLUORINE-CONTAINING POLYMER JSR CORP (JP) 2017-07-19 EP disclosed
WO-2015078731-A1 PROTON SPONGE AS SUPPLEMENT TO ELECTROLYTES FOR PHOTOCATALYTIC AND ELECTROCHEMICAL CO2 REDUCTION SIEMENS AKTIENGESELLSCHAFT (DE) 2015-06-04 WO disclosed
WO-2012132676-A1 RESIST PATTERN FORMING METHOD, RESIST PATTERN, CROSSLINKABLE NEGATIVE CHEMICAL AMPLIFICATION RESIST COMPOSITION FOR ORGANIC SOLVENT DEVELOPMENT, RESIST FILM AND RESIST-COATED MASK BLANKS FUJIFILM CORPORATION (JP) 2012-10-04 WO disclosed
US-8206886-B2 Photosensitive composition and pattern-forming method using the photosensitive composition FUJIFILM CORPORATION (JP) 2012-06-26 US disclosed
US-20110045357-A1 ELECTROLYTE AND CELL SONY CORPORATION (JP) 2011-02-24 US disclosed
EP-2131240-A1 POSITIVE-WORKING RADIATION-SENSITIVE COMPOSITION AND METHOD FOR RESIST PATTERN FORMATION USING THE COMPOSITION JSR Corporation (JP) 2009-12-09 EP disclosed