SCHEMBL1012943

SCHEMBL1012943

CCCCCCCCCCCCCCCCCCOC(=O)C(C)(C)N

nearest known ligand 0.55

Predicted protein targets (top 14)

geneUniProtsupporting neighboursconfidence
NAAA Q02083 1/20 0.53
EPHX1 P07099 1/20 0.50
TSHR P16473 3/20 0.48
HTR2C P28335 1/20 0.47
HCAR2 Q8TDS4 1/20 0.46
RAD52 P43351 1/20 0.46
NPSR1 Q6W5P4 1/20 0.46
ALDH1A1 P00352 2/20 0.45
NPC1 O15118 1/20 0.45
MAPT P10636 1/20 0.45
RAB9A P51151 1/20 0.45
FAAH O00519 1/20 0.44
LMNA P02545 1/20 0.44
ACHE P22303 6/20 0.44

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL22550911 1.00 NAAA (0.53) NAAAEPHX1TSHRHTR2CHCAR2
SCHEMBL31164040 1.00 NAAA (0.53) NAAAEPHX1TSHRHTR2CHCAR2
SCHEMBL3674103 1.00 NAAA (0.53) NAAAEPHX1TSHRHTR2CHCAR2
SCHEMBL4674831 1.00 NAAA (0.53) NAAAEPHX1TSHRHTR2CHCAR2
SCHEMBL6667795 1.00 NAAA (0.53) NAAAEPHX1TSHRHTR2CHCAR2
SCHEMBL5269129 1.00 NAAA (0.53) NAAAEPHX1TSHRHTR2CHCAR2
SCHEMBL936782 1.00 NAAA (0.53) NAAAEPHX1TSHRHTR2CHCAR2
SCHEMBL593838 1.00 NAAA (0.53) NAAAEPHX1TSHRHTR2CHCAR2
Hydrochloric Acid SCHEMBL10576790 0.98 NAAA (0.52) NAAAEPHX1TSHRHTR2CHCAR2
Hydrochloric Acid SCHEMBL3666228 0.98 NAAA (0.52) NAAAEPHX1TSHRHTR2CHCAR2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 12 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-12624227-B2 Manufacturing method for thermal insulating material RESONAC CORPORATION (JP) 2026-05-12 US disclosed
WO-2025089232-A1 SECOND AGENT COMPOSITION FOR HAIR COSMETIC AGENT, HAIR COSMETIC AGENT, AND HAIR COSMETIC KIT ホーユー株式会社 2025-05-01 WO disclosed
US-20230151227-A1 MANUFACTURING METHOD FOR THERMAL INSULATING MATERIAL RESONAC CORPORATION (JP) 2023-05-18 US disclosed
US-20230114711-A1 MANUFACTURING METHOD FOR COATING LIQUID AND MANUFACTURING METHOD FOR THERMAL INSULATING MATERIAL RESONAC CORPORATION (JP) 2023-04-13 US disclosed
EP-4074787-A1 MANUFACTURING METHOD OF HEAT INSULATING MATERIAL Showa Denko Materials Co., Ltd. (JP) 2022-10-19 EP disclosed
EP-4074786-A1 MANUFACTURING METHOD FOR COATING LIQUID AND MANUFACTURING METHOD FOR INSULATING MATERIAL Showa Denko Materials Co., Ltd. (JP) 2022-10-19 EP disclosed
CN-105255620-A Leather detergent HUA WENWEI 2016-01-20 CN disclosed
EP-1500719-B1 Method for producing copper wiring MEC CO LTD (JP) 2011-01-05 EP disclosed
EP-2226410-A1 Etchant and replenishment solution for producing copper wiring MEC COMPANY LTD. (JP) 2010-09-08 EP disclosed
US-7431861-B2 Etchant, replenishment solution and method for producing copper wiring using the same MEC COMPANY LTD. (JP) 2008-10-07 US disclosed
US-20050016961-A1 Etchant, replenishment solution and method for producing copper wiring using the same MEC COMPANY LTD. (JP) 2005-01-27 US disclosed
EP-1500719-A1 Etchant, replenishment solution and method for producing copper wiring using the same MEC COMPANY LTD. (JP) 2005-01-26 EP disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-12624227-B2 Manufacturing method for thermal insulating material ATG13, SAMM50, ACR NAAA 3256/4885EPHX1 4633/4885TSHR 2464/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.