⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL13179782 | 0.84 | — | — | |
| SCHEMBL685615 | 0.83 | — | — | |
| SCHEMBL685632 | 0.82 | — | — | |
| SCHEMBL10136423 | 0.82 | EPHX2 (0.34) | — | |
| SCHEMBL10147207 | 0.77 | — | — | |
| SCHEMBL13522018 | 0.76 | TSHR (0.38) | — | |
| SCHEMBL13522017 | 0.75 | MEN1 (0.31) | — | |
| SCHEMBL685552 | 0.73 | — | — | |
| SCHEMBL21249383 | 0.73 | — | — | |
| SCHEMBL685571 | 0.72 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20120034563-A1 | RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2012-02-09 | — | — | US | disclosed |
| US-20120009519-A1 | COMPOUND, RESIN AND PHOTORESIST COMPOSITION | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2012-01-12 | — | — | US | disclosed |