SCHEMBL13522017

SCHEMBL13522017

C=C(C)C(=O)OCCC1(C(=O)OC2(C(C)CC)C3CC4CC2CC(C)(C4)C3)CC1

nearest known ligand 0.31

Predicted protein targets (top 4)

geneUniProtsupporting neighboursconfidence
MEN1 O00255 1/20 0.31
KMT2A Q03164 1/20 0.31
THRB P10828 1/20 0.30
MAPK1 P28482 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL686032 0.83 TSHR (0.31) KMT2A
SCHEMBL12124071 0.82 THRB (0.32) THRB
SCHEMBL686066 0.81 TSHR (0.33)
SCHEMBL13522018 0.81 TSHR (0.38) MEN1KMT2ATHRBMAPK1
SCHEMBL10136402 0.81 TSHR (0.38) THRB
SCHEMBL10134814 0.75
SCHEMBL10147325 0.74
SCHEMBL684905 0.74
SCHEMBL13522015 0.74 TSHR (0.35) THRBMAPK1
SCHEMBL12417747 0.73

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8298746-B2 Chemically amplified positive resist composition SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2012-10-30 US disclosed
US-20100010129-A1 CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2010-01-14 US disclosed