SCHEMBL10134922

SCHEMBL10134922

C=C(C)C(=O)Oc1cccc(OCC(=O)OCC(F)(F)S(=O)(=O)O)c1

nearest known ligand 0.38

Predicted protein targets (top 16)

geneUniProtsupporting neighboursconfidence
GRM2 Q14416 1/20 0.37
GAA P10253 2/20 0.36
PPARA Q07869 2/20 0.35
PPARG P37231 1/20 0.35
LMNA P02545 1/20 0.35
ALDH1A1 P00352 2/20 0.34
MAPT P10636 1/20 0.34
ELANE P08246 1/20 0.34
ATM Q13315 1/20 0.34
MEN1 O00255 1/20 0.33
HPGD P15428 1/20 0.33
KMT2A Q03164 1/20 0.33
NPSR1 Q6W5P4 1/20 0.33
KDM4E B2RXH2 1/20 0.33
CYP1A2 P05177 1/20 0.32
CYP2C19 P33261 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL10134919 0.89 GAA (0.41) GAALMNAMAPTELANEATM
SCHEMBL14902646 0.82 ELANE (0.40) GAALMNAMAPTELANEMEN1
SCHEMBL14299615 0.82 MAPK1 (0.40) LMNAALDH1A1MAPTMEN1HPGD
SCHEMBL12119801 0.81 TDP1 (0.35) GRM2GAALMNAALDH1A1MAPT
SCHEMBL18470636 0.79 GRM2 (0.36) GRM2GAAPPARAPPARGLMNA
SCHEMBL26312946 0.79 ELANE (0.31) ELANE
SCHEMBL12292330 0.78 CYP1A2 (0.48) GAAALDH1A1MEN1KMT2ANPSR1
SCHEMBL2426446 0.77 CYP1A2 (0.47) GAAALDH1A1MEN1KMT2ANPSR1
SCHEMBL2222135 0.76 TSHR (0.36) ALDH1A1
SCHEMBL12912788 0.76 ALDH1A1 (0.58) GAAPPARGALDH1A1MAPTMEN1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 10 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8980527-B2 Pattern forming process and resist compostion SHIN-ETSU CHEMICAL CO., LTD. (JP) 2015-03-17 US disclosed
US-8980527-B2 Pattern forming process and resist compostion SHIN-ETSU CHEMICAL CO., LTD. (JP) 2015-03-17 US disclosed
US-8815492-B2 Chemically amplified positive resist composition for ArF immersion lithography and pattern forming process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2014-08-26 US disclosed
US-8815492-B2 Chemically amplified positive resist composition for ArF immersion lithography and pattern forming process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2014-08-26 US disclosed
US-20130183621-A1 PATTERN FORMING PROCESS AND RESIST COMPOSTION SHIN-ETSU CHEMICAL CO., LTD. (JP) 2013-07-18 US disclosed
US-20130108964-A1 CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION FOR ArF IMMERSION LITHOGRAPHY AND PATTERN FORMING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2013-05-02 US disclosed
US-8105748-B2 Polymerizable anion-containing sulfonium salt and polymer, resist composition, and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2012-01-31 US disclosed
US-8105748-B2 Polymerizable anion-containing sulfonium salt and polymer, resist composition, and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2012-01-31 US disclosed
US-20100099042-A1 POLYMERIZABLE ANION-CONTAINING SULFONIUM SALT AND POLYMER, RESIST COMPOSITION, AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2010-04-22 US disclosed
US-20100099042-A1 POLYMERIZABLE ANION-CONTAINING SULFONIUM SALT AND POLYMER, RESIST COMPOSITION, AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2010-04-22 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20100099042-A1 POLYMERIZABLE ANION-CONTAINING SULFONIUM SALT AND POLYMER, RESIST COMPOSITION, AND PATTERNING PROCESS ARSA, ACSL3, ASH2L GRM2 2065/4885GAA 4821/4885PPARA 1998/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.