SCHEMBL10148035

SCHEMBL10148035

CCCCCCC(C)C(C)(c1ccc(O)cc1)c1ccc(O)cc1

nearest known ligand 0.47

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ESR1 P03372 7/20 0.47
ESR2 Q92731 5/20 0.47
SLC6A2 P23975 3/20 0.44
SLC6A4 P31645 3/20 0.44
SLC6A3 Q01959 3/20 0.44
ADRA2A P08913 2/20 0.44
ADORA3 P0DMS8 2/20 0.44
TACR2 P21452 2/20 0.44
LMNA P02545 2/20 0.44
CYP3A4 P08684 2/20 0.44
HSD17B10 Q99714 2/20 0.44
ALDH1A1 P00352 2/20 0.44
KDM4E B2RXH2 1/20 0.44
SHBG P04278 1/20 0.44
TP53 P04637 1/20 0.44
HSPD1 P10809 1/20 0.44
ADRB3 P13945 1/20 0.44
HTR2C P28335 1/20 0.44
HSPE1 P61604 1/20 0.44
HIF1A Q16665 1/20 0.44

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL278764 1.00 ESR1 (0.47) ESR1ESR2SLC6A2SLC6A4SLC6A3
SCHEMBL278572 1.00 ESR1 (0.47) ESR1ESR2SLC6A2SLC6A4SLC6A3
SCHEMBL2980562 0.93 ESR1 (0.50) ESR1ESR2SLC6A2SLC6A4SLC6A3
SCHEMBL11795050 0.87 ESR1 (0.47) ESR1ESR2SLC6A2SLC6A4SLC6A3
SCHEMBL11517653 0.82 ESR1 (0.46) ESR1ESR2SLC6A2SLC6A4SLC6A3
SCHEMBL27556298 0.81 CSNK1E (0.38) HSD17B10ALDH1A1MEN1KMT2A
SCHEMBL6440889 0.80 ESR1 (0.47) ESR1ESR2SLC6A2SLC6A4SLC6A3
SCHEMBL29136222 0.79 ESR1 (0.50) ESR1ESR2SLC6A2SLC6A4SLC6A3
SCHEMBL4809781 0.78 ESR1 (0.48) ESR1ESR2SLC6A2SLC6A4SLC6A3
SCHEMBL27980865 0.78 ESR1 (0.50) ESR1ESR2SLC6A2SLC6A4SLC6A3

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8338510-B2 Photosensitive siloxane composition, cured film formed therefrom and device having the cured film TORAY INDUSTRIES, INC. (JP) 2012-12-25 US disclosed
US-20120237873-A1 POSITIVE PHOTOSENSITIVE RESIN COMPOSITION, CURED FILM FORMED FROM THE SAME, AND DEVICE HAVING CURED FILM TORAY INDUSTRIES INC. (JP) 2012-09-20 US disclosed
US-20120178022-A1 POSITIVE PHOTOSENSITIVE RESIN COMPOSITION, CURED FILM OBTAINED USING SAME, AND OPTICAL DEVICE TORAY INDUSTRIES, INC. (JP) 2012-07-12 US disclosed
US-20120021190-A1 PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR FORMING SILICA COATING FILM, AND APPARATUS AND MEMBER EACH COMPRISING SILICA COATING FILM HITACHI CHEMICAL COMPANY, LTD. (JP) 2012-01-26 US disclosed
US-20110008730-A1 POSITIVE-TYPE RADIATION-SENSITIVE COMPOSITION, CURED FILM, INTERLAYER INSULATING FILM, METHOD OF FORMING INTERLAYER INSULATING FILM, DISPLAY DEVICE, AND SILOXANE POLYMER FOR FORMING INTERLAYER INSULATING FILM JSR CORPORATION (JP) 2011-01-13 US disclosed
US-20100129618-A1 PHOTOSENSITIVE SILOXANE COMPOSITION, CURED FILM FORMED THEREFROM AND DEVICE HAVING THE CURED FILM TORAY INDUSTRIES, INC. (JP) 2010-05-27 US disclosed
US-7374856-B2 Positive type photo-sensitive siloxane composition, cured film formed from the composition and device incorporating the cured film TORAY INDUSTRIES, INC. (JP) 2008-05-20 US disclosed