SCHEMBL2980562

SCHEMBL2980562

CCCCC(C)C(C)(c1ccc(O)cc1)c1ccc(O)cc1

nearest known ligand 0.50

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ESR1 P03372 12/20 0.50
ESR2 Q92731 9/20 0.50
SLC6A2 P23975 3/20 0.42
SLC6A4 P31645 3/20 0.42
SLC6A3 Q01959 3/20 0.42
CYP3A4 P08684 3/20 0.42
LMNA P02545 2/20 0.42
HSD17B10 Q99714 2/20 0.42
TYR P14679 1/20 0.42
AR P10275 1/20 0.42
HPGD P15428 1/20 0.42
TSHR P16473 1/20 0.42
HTR6 P50406 1/20 0.42
ESRRG P62508 1/20 0.42
SHBG P04278 2/20 0.40
ALDH1A1 P00352 3/20 0.39
ADRA2A P08913 2/20 0.39
ADORA3 P0DMS8 2/20 0.39
TACR2 P21452 2/20 0.39
KDM4E B2RXH2 1/20 0.39

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL278764 0.93 ESR1 (0.47) ESR1ESR2SLC6A2SLC6A4SLC6A3
SCHEMBL278572 0.93 ESR1 (0.47) ESR1ESR2SLC6A2SLC6A4SLC6A3
SCHEMBL10148035 0.93 ESR1 (0.47) ESR1ESR2SLC6A2SLC6A4SLC6A3
SCHEMBL6440889 0.86 ESR1 (0.47) ESR1ESR2SLC6A2SLC6A4SLC6A3
SCHEMBL29136222 0.86 ESR1 (0.50) ESR1ESR2SLC6A2SLC6A4SLC6A3
SCHEMBL27979885 0.82 MAPT (0.39) ESR1ESR2CYP3A4LMNAHPGD
SCHEMBL996262 0.81 POLB (0.38) ESR2CYP3A4HSD17B10ALDH1A1MEN1
SCHEMBL4809781 0.81 ESR1 (0.48) ESR1ESR2SLC6A2SLC6A4SLC6A3
SCHEMBL17341747 0.81 ESR1 (0.49) ESR1ESR2SLC6A2SLC6A4SLC6A3
SCHEMBL11795050 0.79 ESR1 (0.47) ESR1ESR2SLC6A2SLC6A4SLC6A3

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 25 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-110099972-A Easy peelability coating composition 三菱瓦斯化学株式会社 2019-08-06 CN disclosed
CN-108586723-A Polycondensation resin and optical film formed therefrom 三菱化学株式会社 2018-09-28 CN disclosed
CN-107849344-A Polycarbonate resin compound 华东理工大学 2018-03-27 CN disclosed
CN-107709458-A Polycarbonate resin composition, method for producing same, and molded article 华东理工大学 2018-02-16 CN disclosed
CN-107709459-A Polycarbonate resin composition, method for producing same, and molded article 华东理工大学 2018-02-16 CN disclosed
US-9753385-B2 Electrophotographic photosensitive member, method for manufacturing electrophotographic photosensitive member, process cartridge, and electrophotographic apparatus CANON KABUSHIKI KAISHA (JP) 2017-09-05 US disclosed
US-20160252830-A1 ELECTROPHOTOGRAPHIC PHOTOSENSITIVE MEMBER, METHOD FOR MANUFACTURING ELECTROPHOTOGRAPHIC PHOTOSENSITIVE MEMBER, PROCESS CARTRIDGE, AND ELECTROPHOTOGRAPHIC APPARATUS CANON KABUSHIKI KAISHA (JP) 2016-09-01 US disclosed
CN-102781678-B Thermal recording medium and manufacture method thereof MITSUBISHI PAPER MILLS LTD. (JP) 2015-09-30 CN disclosed
CN-102917883-B Method for manufacturing Heat-sensitive recording material MITSUBISHI PAPER MILLS LTD 2015-01-14 CN disclosed
CN-103402782-A Thermosensitive recording material and method for producing same MITSUBISHI PAPER MILLS LTD 2013-11-20 CN disclosed
US-20100129618-A1 PHOTOSENSITIVE SILOXANE COMPOSITION, CURED FILM FORMED THEREFROM AND DEVICE HAVING THE CURED FILM TORAY INDUSTRIES, INC. (JP) 2010-05-27 US disclosed
US-7635748-B2 Resin and article molded therefrom TORAY INDUSTRIES, INC. (JP) 2009-12-22 US disclosed
US-20080139778-A1 Resin and article molded therefrom TAKANISHI KEIJIRO 2008-06-12 US disclosed
US-7374856-B2 Positive type photo-sensitive siloxane composition, cured film formed from the composition and device incorporating the cured film TORAY INDUSTRIES, INC. (JP) 2008-05-20 US disclosed
US-20060287464-A1 Resin and article molded therefrom TORAY INDUSTRIES, INC. (JP) 2006-12-21 US disclosed
US-7022823-B2 Diazonium salt, its synthesizing method and recording material FUJI PHOTO FILM CO., LTD. (JP) 2006-04-04 US disclosed
EP-1640405-A1 RESIN AND ARTICLE MOLDED THEREFROM TORAY INDUSTRIES, INC. (JP) 2006-03-29 EP disclosed
US-20040039180-A1 Diazonium salt, its synthesizing method and recording material FUJI PHOTO FILM CO., LTD. 2004-02-26 US disclosed
EP-0291315-A2 Heat-sensitive recording paper FUJI PHOTO FILM CO., LTD. (JP) 1988-11-17 EP disclosed
US-4401717-A CONTAINING A CHROMOGEN, A PHENOL LAND A UREA OR CARBAMATE; THERMOGRAPHY FUJI PHOTO FILM CO., LTD. (JP) 1983-08-30 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20040039180-A1 Diazonium salt, its synthesizing method and recording material CACNA1E, HCN2, HCN1 ESR1 4817/4885ESR2 4639/4885SLC6A2 254/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.