Predicted protein targets (top 15)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | LMNA | P02545 | 3/20 | 0.39 |
| ▸ | HTT | P42858 | 2/20 | 0.39 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.39 |
| ▸ | ALDH1A1 | P00352 | 4/20 | 0.38 |
| ▸ | KCNH2 | Q12809 | 2/20 | 0.38 |
| ▸ | HRH3 | Q9Y5N1 | 2/20 | 0.38 |
| ▸ | PPARG | P37231 | 2/20 | 0.35 |
| ▸ | PPARA | Q07869 | 1/20 | 0.35 |
| ▸ | MEN1 | O00255 | 2/20 | 0.34 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.34 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.34 |
| ▸ | CYP2C9 | P11712 | 1/20 | 0.34 |
| ▸ | MCHR1 | Q99705 | 2/20 | 0.33 |
| ▸ | GAA | P10253 | 1/20 | 0.33 |
| ▸ | TSHR | P16473 | 1/20 | 0.33 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL10088185 | 0.92 | MCHR1 (0.41) | LMNAALDH1A1KCNH2HRH3PPARG | |
| SCHEMBL13359734 | 0.91 | HTT (0.38) | LMNAHTTSMN1; SMN2ALDH1A1KCNH2 | |
| SCHEMBL10148407 | 0.89 | HRH3 (0.38) | ALDH1A1KCNH2HRH3PPARGPPARA | |
| SCHEMBL10088192 | 0.88 | PPARG (0.38) | LMNASMN1; SMN2ALDH1A1KCNH2HRH3 | |
| SCHEMBL111764 | 0.86 | ALDH1A1 (0.46) | ALDH1A1KCNH2HRH3MEN1KMT2A | |
| SCHEMBL17147975 | 0.86 | ALDH1A1 (0.40) | LMNASMN1; SMN2ALDH1A1KCNH2HRH3 | |
| SCHEMBL683620 | 0.85 | ALDH1A1 (0.47) | LMNASMN1; SMN2ALDH1A1KCNH2HRH3 | |
| SCHEMBL10148496 | 0.84 | MCHR1 (0.39) | LMNASMN1; SMN2ALDH1A1KCNH2HRH3 | |
| SCHEMBL10088184 | 0.84 | MCHR1 (0.41) | LMNAALDH1A1KCNH2HRH3PPARG | |
| SCHEMBL14219813 | 0.84 | PPARG (0.36) | LMNAHTTSMN1; SMN2ALDH1A1KCNH2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8092976-B2 | High resolution, reduced pattern falling, and good sensitivity and good dissolution contrast achieved even in EUV (extreme ultra violet) exposure, reduction in the line edge roughness | FUJIFILM CORPORATION (JP) | 2012-01-10 | — | — | US | disclosed |
| US-7718344-B2 | microlithography; ultrafine processing of semiconductor using electron beam, X-ray or deep UV; high sensitivity, high resolution and good line edge roughness; suppression of vaporized outgas; a polystyrene with an acid-decomposable group; 10-tolyl-9-oxothioxanthenium nonafluorobutanesulfonate | FUJIFILM CORPORATION (JP) | 2010-05-18 | — | — | US | disclosed |
| US-20080085468-A1 | microlithography; ultrafine processing of semiconductor using electron beam, X-ray or deep UV; high sensitivity, high resolution and good line edge roughness; suppression of vaporized outgas; a polystyrene with an acid-decomposable group; 10-tolyl-9-oxothioxanthenium nonafluorobutanesulfonate | FUJIFILM CORPORATION (JP) | 2008-04-10 | — | — | US | disclosed |
| US-20080081282-A1 | RESIST COMPOSITION AND PATTERN FORMING METHOD USING THE SAME | FUJIFILM CORPORATION (JP) | 2008-04-03 | — | — | US | disclosed |