SCHEMBL683620

SCHEMBL683620

CCC(C)c1ccc(OC(C)OCCOc2ccc(C3CCCC3)cc2)cc1

nearest known ligand 0.47

Predicted protein targets (top 14)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 5/20 0.47
HRH3 Q9Y5N1 6/20 0.41
KCNH2 Q12809 4/20 0.41
KMT2A Q03164 2/20 0.39
MEN1 O00255 1/20 0.39
TDP1 Q9NUW8 1/20 0.39
TSHR P16473 1/20 0.39
KDM4E B2RXH2 1/20 0.39
CYP2C9 P11712 3/20 0.36
LMNA P02545 1/20 0.35
SMN1; SMN2 Q16637 1/20 0.35
ACACB O00763 2/20 0.35
ORAI1 Q96D31 1/20 0.35
CYP3A4 P08684 2/20 0.34

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL111764 0.99 ALDH1A1 (0.46) ALDH1A1HRH3KCNH2KMT2AMEN1
SCHEMBL17931689 0.93 HRH3 (0.45) ALDH1A1HRH3KCNH2KMT2AMEN1
SCHEMBL17147975 0.89 ALDH1A1 (0.40) ALDH1A1HRH3KCNH2KMT2AMEN1
SCHEMBL14252179 0.89 HRH3 (0.45) ALDH1A1HRH3KCNH2KMT2AMEN1
SCHEMBL18195485 0.89 ALDH1A1 (0.55) ALDH1A1HRH3KCNH2KMT2AMEN1
SCHEMBL10088187 0.88 ALDH1A1 (0.45) ALDH1A1HRH3KCNH2KMT2AMEN1
SCHEMBL16200773 0.87 HRH3 (0.38) ALDH1A1HRH3KCNH2KDM4ECYP2C9
SCHEMBL683579 0.87 PPARG (0.40) ALDH1A1KMT2AMEN1TDP1
SCHEMBL6721650 0.87 HRH3 (0.40) ALDH1A1HRH3KCNH2CYP2C9CYP3A4
SCHEMBL17175358 0.86 ALDH1A1 (0.44) ALDH1A1HRH3KCNH2KMT2AMEN1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9090722-B2 Chemical amplification resist composition, and mold preparation method and resist film using the same FUJIFILM CORPORATION (JP) 2015-07-28 US disclosed
US-9090722-B2 Chemical amplification resist composition, and mold preparation method and resist film using the same FUJIFILM CORPORATION (JP) 2015-07-28 US disclosed
US-20120006788-A1 CHEMICAL AMPLIFICATION RESIST COMPOSITION, AND MOLD PREPARATION METHOD AND RESIST FILM USING THE SAME FUJIFILM CORPORATION (JP) 2012-01-12 US disclosed
US-20120006788-A1 CHEMICAL AMPLIFICATION RESIST COMPOSITION, AND MOLD PREPARATION METHOD AND RESIST FILM USING THE SAME FUJIFILM CORPORATION (JP) 2012-01-12 US disclosed
WO-2010150917-A1 CHEMICAL AMPLIFICATION RESIST COMPOSITION, AND MOLD PREPARATION METHOD AND RESIST FILM USING THE SAME FUJIFILM CORPORATION (JP) 2010-12-29 WO disclosed