Predicted protein targets (top 12)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | KMT2A | Q03164 | 4/20 | 0.34 |
| ▸ | MEN1 | O00255 | 3/20 | 0.34 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.34 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.33 |
| ▸ | LMNA | P02545 | 1/20 | 0.33 |
| ▸ | GLA | P06280 | 1/20 | 0.33 |
| ▸ | EPHX2 | P34913 | 2/20 | 0.32 |
| ▸ | CYP17A1 | P05093 | 1/20 | 0.32 |
| ▸ | CYP19A1 | P11511 | 1/20 | 0.32 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.32 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.32 |
| ▸ | CNR2 | P34972 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL47390 | 0.85 | KMT2A (0.35) | KMT2AMEN1MAPK1ALDH1A1LMNA | |
| SCHEMBL119887 | 0.84 | KMT2A (0.34) | KMT2AMEN1MAPK1ALDH1A1LMNA | |
| SCHEMBL2740754 | 0.84 | KMT2A (0.34) | KMT2AMEN1MAPK1ALDH1A1LMNA | |
| SCHEMBL19978612 | 0.81 | KMT2A (0.33) | KMT2AMEN1MAPK1ALDH1A1LMNA | |
| SCHEMBL18199028 | 0.80 | EPHX2 (0.33) | KMT2AMEN1MAPK1ALDH1A1LMNA | |
| SCHEMBL106979 | 0.80 | MEN1 (0.32) | KMT2AMEN1MAPK1ALDH1A1LMNA | |
| SCHEMBL18802878 | 0.80 | MEN1 (0.33) | KMT2AMEN1MAPK1ALDH1A1LMNA | |
| SCHEMBL19753662 | 0.80 | MEN1 (0.33) | KMT2AMEN1MAPK1ALDH1A1LMNA | |
| SCHEMBL2754854 | 0.79 | ALDH1A1 (0.33) | KMT2AMEN1MAPK1ALDH1A1LMNA | |
| SCHEMBL14213223 | 0.79 | MEN1 (0.35) | KMT2AMEN1ALDH1A1LMNAEPHX2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8987386-B2 | Method of producing polymeric compound, resist composition, and method of forming resist pattern | TOKYO OHKA KOGYO CO., LTD. (JP) | 2015-03-24 | — | — | US | disclosed |
| US-20120328993-A1 | METHOD OF PRODUCING POLYMERIC COMPOUND, RESIST COMPOSITION, AND METHOD OF FORMING RESIST PATTERN | TOKYO OHKA KOGYO CO., LTD. (JP) | 2012-12-27 | — | — | US | disclosed |
| US-8092976-B2 | High resolution, reduced pattern falling, and good sensitivity and good dissolution contrast achieved even in EUV (extreme ultra violet) exposure, reduction in the line edge roughness | FUJIFILM CORPORATION (JP) | 2012-01-10 | — | — | US | disclosed |
| US-20080081282-A1 | RESIST COMPOSITION AND PATTERN FORMING METHOD USING THE SAME | FUJIFILM CORPORATION (JP) | 2008-04-03 | — | — | US | disclosed |